Characterization of SiO2 layers thermally grown on 4H-SiC using high energy photoelectron spectroscopy

被引:12
|
作者
Johansson, LI [1 ]
Glans, PA
Wahab, Q
Grehk, TM
Eickhoff, T
Drube, W
机构
[1] Linkoping Univ, Dept Phys, S-58183 Linkoping, Sweden
[2] DESY, Hamburger Synchrotronstrahlungslab Hasylab, D-22603 Hamburg, Germany
关键词
SiC/SiO2; interfaces; silicon carbide;
D O I
10.1016/S0169-4332(99)00238-X
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Si 2p and C 1s core level spectra recorded at different electron emission angles from SiO2/SiC samples using a photon energy of 3.0 keV show two components. These are identified as originating from SiO2 and SiC for Si 2p while for C 1s they are identified to originate from graphite like carbon and SiC. The relative intensity of these components are extracted and compared to calculated intensity variations assuming different models for the elemental distribution in the surface region. For both samples investigated best agreement between experimental and calculated intensity variations with emission angle is obtained when assuming a graphite like layer on top of the oxide layer. Contribution from carbon at the SiC/SiO2 interface could not be identified. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:137 / 142
页数:6
相关论文
共 50 条
  • [31] Atomic scale characterization of SiO2/4H-SiC interfaces in MOSFETs devices
    Beltran, A. M.
    Duguay, S.
    Strenger, C.
    Bauer, A. J.
    Cristiano, F.
    Schamm-Chardon, S.
    SOLID STATE COMMUNICATIONS, 2015, 221 : 28 - 32
  • [32] Characterization of anodic SiO2 films on P-type 4H-SiC
    Woon, W. S.
    Hutagalung, S. D.
    Cheong, K. Y.
    THIN SOLID FILMS, 2009, 517 (08) : 2808 - 2812
  • [33] Conductive atomic force microscopy studies on the reliability of thermally oxidized SiO2/4H-SiC
    Fiorenza, Patrick
    Lo Nigro, Raffaella
    Raineri, Vito
    Salinas, Dario
    SILICON CARBIDE AND RELATED MATERIALS 2006, 2007, 556-557 : 501 - +
  • [34] Structure of thermally grown SiO2 on crystalline 6H-SiC
    Tsuchida, H
    Kamata, I
    Izumi, K
    AMORPHOUS AND CRYSTALLINE INSULATING THIN FILMS - 1996, 1997, 446 : 273 - 278
  • [35] Effect of Post-Oxidation Annealing on High-Temperature Grown SiO2/4H-SiC Interface
    Moon, Jeong Hyun
    Cheong, Kuan Yew
    Song, Ho Keun
    Yiml, Jeong Hyuk
    Oh, Myeong Sook
    Lee, Jong Ho
    Bahng, Wook
    Kim, Nam-Kyun
    Kim, Hyeong Joon
    SILICON CARBIDE AND RELATED MATERIALS 2007, PTS 1 AND 2, 2009, 600-603 : 731 - +
  • [36] Annealing influence on stoichiometry and band alignment of 4H-SiC/SiO2 interface evaluated by x-ray photoelectron spectroscopy
    Yuan, Ruihong
    Wang, Jingqi
    Chen, Tianyu
    He, Mu
    Ma, Yao
    Huang, Mingmin
    Liu, Liqiang
    Li, Yun
    Yang, Zhimei
    Gong, Min
    Xu, Qian
    Huang, Wende
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2024, 39 (11)
  • [37] Probing the surface potential of SiO2/4H-SiC(0001) by terahertz emission spectroscopy
    Nakanishi, Hidetoshi
    Nishimura, Tatsuhiko
    Kawayama, Iwao
    Tonouchi, Masayoshi
    Hosoi, Takuji
    Shimura, Takayoshi
    Watanabe, Heiji
    JOURNAL OF APPLIED PHYSICS, 2021, 130 (11)
  • [38] Impact of the Morphological and Electrical Properties of SiO2/4H-SiC Interfaces on the Behavior of 4H-SiC MOSFETs
    Roccaforte, Fabrizio
    Fiorenza, Patrick
    Giannazzo, Filippo
    ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, 2013, 2 (08) : N3006 - N3011
  • [39] Characterization of GaN grown on 4H-SiC and sapphire by Raman spectroscopy and high resolution XRD
    Duan Huantao
    Gu Wenping
    Zhang Jincheng
    Hao Yue
    Chen Chi
    Ni Jinyu
    Xu Shengrui
    JOURNAL OF SEMICONDUCTORS, 2009, 30 (07)
  • [40] Characterization of GaN grown on 4H-SiC and sapphire by Raman spectroscopy and high resolution XRD
    段焕涛
    谷文萍
    张进成
    郝跃
    陈炽
    倪金玉
    许昇瑞
    半导体学报, 2009, (07) : 22 - 26