Investigating bipolar resistive switching characteristics in filament type and interface type BON-based resistive switching memory

被引:0
作者
Tseng, Hsueh-Chih [1 ]
Chang, Ting-Chang [1 ,2 ]
Cheng, Kai-Hung [3 ]
Huang, Jheng-Jie [1 ]
Chen, Yu-Ting [3 ]
Jian, Fu-Yen [1 ]
Sze, Simon M. [1 ,4 ,5 ]
Tsai, Ming-Jinn [6 ]
Chu, Ann-Kuo [3 ]
Wang, Ying-Lang [7 ]
机构
[1] Natl Sun Yat Sen Univ, Dept Phys, Kaohsiung 804, Taiwan
[2] Natl Cheng Kung Univ, Adv Optoelect Technol Ctr, Tainan 701, Taiwan
[3] Natl Sun Yat Sen Univ, Dept Photon, Kaohsiung 804, Taiwan
[4] Stanford Univ, Dept Elect Engn, Stanford, CA 94305 USA
[5] Natl Chiao Tung Univ, Dept Elect Engn, Hsinchu 300, Taiwan
[6] Ind Technol Res Inst, Elect & Optoelect Res Lab, Hsinchu 310, Taiwan
[7] Taiwan Semicond Mfg Co, Hsinchu, Taiwan
关键词
ReRAM; BON; BON:Gd; Interface type; NDR; RANDOM-ACCESS MEMORY; THIN-FILM; OXIDE; RESISTANCE; NANOCRYSTALS; DEVICES; OXYGEN; SRTIO3; LAYER;
D O I
10.1016/j.tsf.2012.09.031
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
This paper studies the effect of doping on BON-based resistive switching characteristics. Typical bipolar resistive switching behavior can be observed in Pt/BON/TiN and Pt/BON:Gd/TiN devices. The conductive path(s) of the Pt/BON/TiN is vacancy-dominated while the Pt/BON:Gd/TiN is metal-dominated. Additionally, there is an atypical bipolar resistive switching in the Gd-doping device. This atypical characteristic has not only a size effect, but also a lower operating current. The resistance transitions are due to the variation in conductance of the switching layer, which is clearly influenced by the different area size. A mechanism is proposed to explain this atypical characteristic. (c) 2012 Elsevier B.V. All rights reserved.
引用
收藏
页码:389 / 393
页数:5
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