Effect of an Ultraviolet-Ozone Treatment on the Electrical Properties of Titanium-Oxide Thin-Film Transistors Fabricated by Using a Sol-Gel Process

被引:11
作者
Chong, Ho Yong [1 ]
Lee, Se Han [1 ]
Kim, Tae Whan [1 ]
机构
[1] Hanyang Univ, Dept Elect & Comp Engn, Seoul 133791, South Korea
基金
新加坡国家研究基金会;
关键词
INDIUM-TIN-OXIDE; DIOXIDE; TIOX; PHOTOLUMINESCENCE; PLASMA; DIODE; FIELD; RF;
D O I
10.1149/2.016207jes
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Thin-film transistors (TFTs) utilizing titanium-oxide channel layers were fabricated by using a sol-gel process. The device characteristics of the channel layer for the TFTs were enhanced, resulting in a shift of the threshold voltage and in a decrease of the off-current. The on/off current ratio of the ultraviolet-ozone-treated TFTs was as large as 4.78 x 10(5). The surface carrier concentration of the titanium-oxide was decreased due to the decrease in the oxygen deficiency resulting from the negatively-charged oxygen. (C) 2012 The Electrochemical Society. [DOI: 10.1149/2.016207jes] All rights reserved.
引用
收藏
页码:B771 / B774
页数:4
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