ZnON MIS Thin-Film Diodes

被引:2
作者
Daut, Mohamad Hazwan Mohd [1 ]
Wager, John F. [2 ]
Nathan, Arokia [1 ,3 ]
机构
[1] Univ Cambridge, Dept Engn, Cambridge CB3 0FA, England
[2] Oregon State Univ, Dept Elect & Comp Engn, Corvallis, OR 97331 USA
[3] Cambridge Touch Technol, Cambridge CB4 0GN, England
来源
IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY | 2019年 / 7卷 / 01期
基金
英国工程与自然科学研究理事会;
关键词
Metal oxide semiconductor; zinc oxynitride; MIS diode; thin film device; SCHOTTKY DIODES; ELECTRICAL CHARACTERIZATION; IV PLOT; PERFORMANCE; PARAMETERS; BARRIER; FABRICATION; EXTRACTION; AG;
D O I
10.1109/JEDS.2019.2900542
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Zinc oxynitride metal-insulator-semiconductor diodes are fabricated and characterized. Although these devices display excellent rectification, their temperature-dependent current-voltage characteristics are not explicable using analysis methodologies currently available in the literature. Therefore, we employ a simple curve fitting strategy in order to elucidate measured trends. It is found that the forward current trends are describable using three parameters, i.e., reverse saturation current, ideality factor, and series resistance, whereas the reverse current temperature dependence only requires one parameter, i.e., shunt resistance. All four of these model parameters are found to be strongly temperature dependent.
引用
收藏
页码:375 / 381
页数:7
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