Vertically Aligned Peptide Nanostructures Using Plasma-Enhanced Chemical Vapor Deposition

被引:41
作者
Vasudev, Milana C. [1 ]
Koerner, Hilmar [1 ]
Singh, Kristi M. [1 ]
Partlow, Benjamin P. [2 ]
Kaplan, David L. [2 ]
Gazit, Ehud [3 ]
Bunning, Timothy J. [1 ]
Naik, Rajesh R. [1 ]
机构
[1] Mat & Mfg Directorate, Soft Matter Mat Branch, Dayton, OH 45433 USA
[2] Tufts Univ, Dept Biomed Engn, Medford, MA 02155 USA
[3] Tel Aviv Univ, Mol Biol & Biotechnol Dept, IL-69978 Tel Aviv, Israel
关键词
THIN-FILMS; AMINO-ACID; NANOTUBES; DIPHENYLALANINE; NANOWIRES; PECVD; POLYMERIZATION; TEMPERATURE; FABRICATION; ELECTRODES;
D O I
10.1021/bm401491k
中图分类号
Q5 [生物化学]; Q7 [分子生物学];
学科分类号
071010 ; 081704 ;
摘要
`In this study, we utilize plasma-enhanced chemical vapor deposition (PECVD) for the deposition of nanostructures composed of diphenylalanine. PECVD is a solvent-free approach and allows sublimation of the peptide to form dense, uniform arrays of peptide nanostructures on a variety of substrates. The PECVD deposited D-diphenylalanine nanostructures have a range of chemical and physical properties depending On the specific discharge Parameters used during the deposition process.
引用
收藏
页码:533 / 540
页数:8
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