Why do nanowires grow with their c-axis vertically-aligned in the absence of epitaxy?

被引:15
作者
Azulay, Almog R. [1 ]
Turkulets, Yury [1 ]
Del Gaudio, Davide [2 ]
Goldman, R. S. [2 ]
Shalish, Ilan [1 ]
机构
[1] Ben Gurion Univ Negev, Sch Elect & Comp Engn, IL-8410501 Beer Sheva, Israel
[2] Univ Michigan, Dept Mat Sci & Engn, 2300 Hayward St, Ann Arbor, MI 48109 USA
基金
美国国家科学基金会;
关键词
NEGATIVE CHARGE; POLAR SURFACES; ZNO NANORODS; MECHANISM; GATE; GAN;
D O I
10.1038/s41598-020-63500-y
中图分类号
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号
07 ; 0710 ; 09 ;
摘要
Images of uniform and upright nanowires are fascinating, but often, they are quite puzzling, when the substrate is clearly not an epitaxial template. Here, we reveal the physics underlying one such hidden growth guidance mechanism through a specific example - the case of ZnO nanowires grown on silicon oxide. We show how electric fields exerted by the insulating substrate may be manipulated through the surface charge to define the orientation and polarity of the nanowires. Surface charge is ubiquitous on the surfaces of semiconductors and insulators, and as a result, substrate electric fields need always be considered. Our results suggest a new concept, according to which the growth of wurtzite semiconductors may often be described as a process of electric-charge-induced self-assembly, wherein the internal built-in field in the polar material tends to align in parallel to an external field exerted by the substrate to minimize the interfacial energy of the system.
引用
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页数:6
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