Micron and sub-micron gratings on glass by UV laser ablation

被引：11
作者：
Meinertz, J. [1 ]
Fricke-Begemann, T. [1 ]
Ihlemann, J. [1 ]
机构：
[1] Laser Lab Gottingen, D-37077 Gottingen, Germany
来源：
LASERS IN MANUFACTURING (LIM 2013) | 2013年 / 41卷
关键词：
UV-laser; glass; grating; ablation; diffractive patterns; FUSED-SILICA; EXCIMER;
D O I：
10.1016/j.phpro.2013.03.137
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
ArF excimer laser ablation is applied for the generation of surface relief gratings on various glass materials. At the laser wavelength of 193 nm even highly transparent borosilicate glasses exhibit sufficient absorption for the fabrication of precise, crack free ablation patterns. Gratings with periods down to 3 mu m are created in a line by line process by projecting a laser illuminated slit onto the glass surface. Micron- and sub-micron-periodic gratings are made by projecting a transmission grating using a Schwarzschild objective. Such gratings can be applied for surface functionalization or diffractive marking. (C) 2013 The Authors. Published by Elsevier B.V.
引用
收藏
页码：701 / 705
页数：5
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