Determination of interstitial oxygen atom position in U2N3+xOy by near edge structure study

被引：7

作者：

Jiang, A. K. ^{[1
]}

Zhao, Y. W. ^{[2
]}

Long, Z. ^{[2
]}

Hu, Y. ^{[1
]}

Wang, X. F. ^{[1
]}

Yang, R. L. ^{[1
]}

Bao, H. L. ^{[3
]}

Zeng, R. G. ^{[1
,2
]}

Liu, K. Z. ^{[1
]}

机构：

[1] Sci & Technol Surface Phys & Chem Lab, POB 9-35, Jiangyou City 621908, Sichuan, Peoples R China

[2] China Acad Engn Phys, Inst Mat, POB 9, Jiangyou City 621907, Sichuan, Peoples R China

[3] Chinese Acad Sci, Shanghai Inst Appl Phys, Dept Molten Salt Chem & Engn, Shanghai 201800, Peoples R China

来源：

JOURNAL OF NUCLEAR MATERIALS | 2018年 / 504卷

基金：

中国国家自然科学基金;

关键词：

Uranium oxy-nitride; EXAFS; NEXAFS; ELNES; X-RAY-ABSORPTION; INITIAL OXIDATION BEHAVIORS; K-EDGE; ELECTRONIC-STRUCTURE; URANIUM NITRIDE; METAL; SPECTRA; OXIDES; PASSIVATION; DIOXIDE;

D O I：

10.1016/j.jnucmat.2018.03.039

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The determination of interstitial oxygen atom site in U2N3+xOy film could facilitate the understanding of the oxidation mechanism of alpha-U2N3 and the effect of U2N3+xOy on anti-oxidation. By comparing the similarities and variances between N K edge and O K edge electron energy loss spectra (EELS) for oxidized alpha-U2N3 and UO2, the present work looks at the local structure of nitrogen and oxygen atoms in U2N3+xOy film, identifying the most possible position of interstitial O atom. (C) 2018 Elsevier B.V. All rights reserved.

引用

页码：215 / 220

页数：6

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