Growth of Niobium Thin Films on Si Substrates by Pulsed Nd:YAG Laser Deposition

被引：11

作者：

Gontad, Francisco ^{[1
,2
]}

Lorusso, Antonella ^{[1
,2
]}

Solombrino, Luigi ^{[1
,2
]}

Koutselas, Ioannis ^{[3
]}

Vainos, Nikos ^{[3
]}

Perrone, Alessio ^{[1
,2
]}

机构：

[1] Univ Salento, Dept Math & Phys E De Giorgi, I-73100 Lecce, Italy

[2] Univ Salento, Natl Inst Nucl Phys, I-73100 Lecce, Italy

[3] Univ Patras, Dept Mat Sci, Patras 26500, Greece

来源：

JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY | 2015年 / 31卷 / 08期

关键词：

Pulsed laser deposition; Nb thin films; Ablation and deposition rate; ABLATION; METAL;

D O I：

10.1016/j.jmst.2015.06.007

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The growth of Nb thin films on Si(100) substrates by pulsed Nd:YAG laser deposition (PLD) under different laser fluences (4-15 J/cm(2)) was reported. The influence of laser fluence on ablation rate and deposition rate was discussed. X-ray diffraction (XRD) investigations of the deposited films showed an amorphous structure. The droplet density on the film surface observed by scanning electron microscopy (SEM) analyses was extremely low. It was experimentally proved that the droplets on the film surface originated from liquid phase on the target surface. Profilometric measurements of the deposited Nb films revealed a substantial asymmetry in the film thickness related to the plume deflection effect. The measured electrical resistivity of the Nb film was higher than that of high purity Nb bulk. The present investigations of ablation and deposition process of Nb thin films are related to its potential application in superconducting radio-frequency (SRF) cavities. Copyright (C) 2015, The editorial office of Journal of Materials Science & Technology. Published by Elsevier Limited. All rights reserved.

引用

页码：784 / 789

页数：6

共 26 条

[1] Uniform target ablation in pulsed-laser deposition [J].

Arnold, N ;

Bäuerle, D .

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1999, 68 (03) :363-367

[2]

Baraldi G, 2011, APPL PHYS A-MATER, V105, P75, DOI [10.1007/s00339-011-6523-9, 10.1007/s00339-011-6523]

[3]

Basiev TT, 2006, QUANTUM ELECTRON+, V36, P609, DOI 10.1070/QE2006v036n06ABEH013171

[4]

CHRISEY D.B., 2003, PULSED LASER DEPOSIT

[5] Finite element analysis of the initial stages of the laser ablation process [J].

Conde, JC ;

Lusquiños, F ;

González, P ;

Serra, J ;

León, B ;

Dima, A ;

Cultrera, L ;

Guido, D ;

Zocco, A ;

Perrone, A .

THIN SOLID FILMS, 2004, 453 :323-327

[6] Investigation of liquid droplets, plume deflection, and a columnar structure in laser ablation of silicon [J].

Cultrera, L ;

Zeifman, MI ;

Perrone, A .

PHYSICAL REVIEW B, 2006, 73 (07)

[7] Droplet distributions from melt displacement and ejection mechanism during Al ns-laser ablation and deposition experiments: Influence of laser spot position [J].

Cultrera, L. ;

Lorusso, A. ;

Maiolo, B. ;

Cangueiro, L. ;

Vilar, R. ;

Perrone, A. .

JOURNAL OF APPLIED PHYSICS, 2014, 115 (09)

[8] Detailed studies of aluminum thin films morphology deposited by pulsed laser ablation [J].

Cultrera, L. ;

Miglietta, P. ;

Perrone, A. .

JOURNAL OF ALLOYS AND COMPOUNDS, 2010, 504 :S399-S404

[9] Pulsed laser deposition: metal versus oxide ablation [J].

Doeswijk, LM ;

Rijnders, G ;

Blank, DHA .

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2004, 78 (03) :263-268

[10] Detailed mass spectrometric studies during laser ablation of yttrium target in high vacuum [J].

Gontad, F. ;

Lorusso, A. ;

Perrone, A. .

THIN SOLID FILMS, 2012, 520 (16) :5211-5214

← 1 2 3 →