Growth conditions and surface morphology of AlN MOVPE

被引：41
作者：
Lobanova, A. V. [1 ]
Yakovlev, E. V. [1 ]
Talalaev, R. A. [1 ]
Thapa, S. B. [2 ]
Scholz, F. [2 ]
机构：
[1] Soft Impact Ltd, STR Grp, St Petersburg 194156, Russia
[2] Univ Ulm, Inst Optoelect, D-89081 Ulm, Germany
来源：
JOURNAL OF CRYSTAL GROWTH | 2008年 / 310卷 / 23期
关键词：
AlN nanoparticles; Computer simulation; Surface morphology; Metal-organic vapor phase epitaxy; AlN; Nitrides;
D O I：
10.1016/j.jcrysgro.2008.07.098
中图分类号：
O7 [晶体学];
学科分类号：
0702 ; 070205 ; 0703 ; 080501 ;
摘要：
Experimental and modeling studies of AlN metal-organic vapor phase epitaxy (MOVPE) are aimed at the analysis of surface morphology variations with growth conditions. It was found that flattest surfaces can be obtained at high temperature, reduced growth rate, and optimal V/III ratio. Detailed simulation of AlN growth and comparison of the results with trends reported in the literature point out that the improvement of the Surface morphology is due to the reduced parasitic gas-phase reactions and increased migration length of adsorbed species on the surface. (C) 2008 Elsevier B.V. All rights reserved.
引用
收藏
页码：4935 / 4938
页数：4
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