Pulsed direct liquid injection ALD of TiO2 films using titanium tetraisopropoxide precursor

被引：5

作者：

Avril, L. ^{[1
]}

Decams, J. M. ^{[2
]}

Imhoff, L. ^{[1
]}

机构：

[1] Univ Bourgogne, Lab Interdisciplinaire Carnot Bourgogne ICB, UMR CNRS 6303, 9 Av A Savary,BP 47 870, F-21078 Dijon, France

[2] Annealsys, F-34055 Montpellier, France

来源：

NINETEENTH EUROPEAN CONFERENCE ON CHEMICAL VAPOR DEPOSITION (EUROCVD 19) | 2013年 / 46卷

关键词：

Pulsed liquid injection ALD; Titanium oxides; Titanium tetraisopropoxide precursor; Thin films; ATOMIC LAYER DEPOSITION; GROWTH; MOCVD;

D O I：

10.1016/j.phpro.2013.07.063

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

TiO2 thin films are grown by pulsed direct liquid injection atomic layer deposition with rapid thermal heating using titanium tetraisopropoxide and water vapor as precursors. The ALD growth rate is constant in the saturation zone range 35-47 ms at the temperature deposition of 280 degrees C. The TiO2 growth rate of 0.018 nm/cycle was achieved in a self-limited ALD mode. SEM and AFM analysis showed the as-deposited films have a smooth surface with a low roughness. XPS analysis exhibited the stoichiometry of TiO2 in the homogenous depth composition. (C) 2013 The Authors. Published by Elsevier B.V.

引用

页码：33 / 39

页数：7

共 19 条

[1] Titanium isopropoxide as a precursor for atomic layer deposition:: characterization of titanium dioxide growth process [J].

Aarik, J ;

Aidla, A ;

Uustare, T ;

Ritala, M ;

Leskelä, M .

APPLIED SURFACE SCIENCE, 2000, 161 (3-4) :385-395

[2] Direct liquid injection MOCVD growth of TiO2 films using the precursor Ti(mpd)(dmae)2 [J].

Awaluddin, A ;

Pemble, ME ;

Jones, AC ;

Williams, PA .

JOURNAL DE PHYSIQUE IV, 2001, 11 (PR3) :531-537

[3] Elastic behaviour of titanium dioxide films on polyimide substrates studied by in situ tensile testing in a X-ray diffractometer [J].

Bontempi, Elza ;

Zanola, Paolo ;

Gelfi, Marcello ;

Zucca, Marcello ;

Depero, Laura E. ;

Girault, Baptiste ;

Goudeau, Philippe ;

Geandier, Guillaume ;

Le Bourhis, Eric ;

Renault, Pierre-Olivier .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2010, 268 (3-4) :365-369

[4] The surface science of titanium dioxide [J].

Diebold, U .

SURFACE SCIENCE REPORTS, 2003, 48 (5-8) :53-229

[5] Investigation of ion pair formation in the triphenylmethyl chloride-trimethyl aluminium system, as a model for the activation of olefin polymerization catalyst [J].

Eide, O. K. ;

Ystenes, M. ;

Stovneng, J. A. ;

Eilertsen, J. L. .

VIBRATIONAL SPECTROSCOPY, 2007, 43 (01) :210-216

[6] Atomic Layer Deposition: An Overview [J].

George, Steven M. .

CHEMICAL REVIEWS, 2010, 110 (01) :111-131

[7] Correlation between bioactivity and structural properties of titanium dioxide coatings grown by atomic layer deposition [J].

Grigal, I. P. ;

Markeev, A. M. ;

Gudkova, S. A. ;

Chernikova, A. G. ;

Mityaev, A. S. ;

Alekhin, A. P. .

APPLIED SURFACE SCIENCE, 2012, 258 (08) :3415-3419

[8] Self-limiting nature in atomic-layer epitaxy of rutile thin films from TiCl4 and H2O on sapphire (001) substrates [J].

Kumagai, H. ;

Masuda, Y. ;

Shinagawa, T. .

JOURNAL OF CRYSTAL GROWTH, 2011, 314 (01) :146-150

[9] Atomic layer deposition chemistry:: Recent developments and future challenges [J].

Leskelä, M ;

Ritala, M .

ANGEWANDTE CHEMIE-INTERNATIONAL EDITION, 2003, 42 (45) :5548-5554

[10] Atomic layer deposition (ALD):: from precursors to thin film structures [J].

Leskelä, M ;

Ritala, M .

THIN SOLID FILMS, 2002, 409 (01) :138-146

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