Optical investigations of Cr and CrN layers obtained by magnetron sputtering in Ion Beam Assisted Deposition process (IBAD)

被引：4

作者：

Oleszkiewicz, W ^{[1
]}

Oleszkiewicz, E ^{[1
]}

Zukowska, K ^{[1
]}

机构：

[1] Wroclaw Univ Technol, Inst Microsyst Technol, Wroclaw, Poland

来源：

11TH SLOVAK-CZECH-POLISH OPTICAL CONFERENCE ON WAVE AND QUANTUM ASPECTS OF CONTEMPORARY OPTICS | 1999年 / 3820卷

关键词：

Cr; CrN; ion beam assisted deposition (IBAD); magnetron sputtering; ellipsometry; optical constants;

D O I：

10.1117/12.353095

中图分类号：

R318 [生物医学工程];

学科分类号：

0831 ;

摘要：

In the ion beam deposition process the source of material was Cr target subjected to magnetron sputtering. Cr and CrN layers deposition processes were caried out in the presence of Ar and Ar+N-2 ions atmosphere. The optical investigations of Cr and CrN layers obtained by IBAD processes were made to estimate the efficiency of such modyfying factor as ion beam bombardment. The optical constants n and k were determined by ellipsometry for Cr and CrN layers deposited onto grounded or negatively biased (bias voltages from 0 to 500V) BK7 glass substrates.

引用

页码：423 / 428

页数：6