Recent developments in spectroscopic ellipsometry for in situ applications

被引：28

作者：

Johs, B ^{[1
]}

Hale, J ^{[1
]}

Ianno, NJ ^{[1
]}

Herzinger, CM ^{[1
]}

Tiwald, T ^{[1
]}

Woollam, JA ^{[1
]}

机构：

[1] JA Woolam Co Inc, Lincoln, NE 68508 USA

来源：

OPTICAL METROLOGY ROADMAP FOR THE SEMICONDUCTOR, OPTICAL, AND DATA STORAGE INDUSTRIES II | 2001年 / 4449卷

关键词：

ellipsometry; spectroscopy; in situ; real-time; process control;

D O I：

10.1117/12.450108

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The in situ measurement capabilities and advantages of recently developed spectroscopic ellipsometry (SE) instrumentation,, which covers wide spectral ranges ( 190 - 1700nm. or 0.73 - 6.5 eV) and is based on rotating-compensator technology, are described. A technique which can quantitatively correct for window birefringence is presented. Current in situ SE deposition monitoring and control applications in the compound semiconductor, display, and optical coatings industries are also presented.

引用

页码：41 / 57

页数：5

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