α-Cr2O3 template-texture effect on α-Al2O3 thin-film growth

被引：85
作者：
Eklund, P. [1 ]
Sridharan, M.
Sillassen, M.
Bottiger, J.
机构：
[1] Univ Aarhus, Interdisciplinary Nanosci Ctr iNANO, DK-8000 Aarhus C, Denmark
来源：
THIN SOLID FILMS | 2008年 / 516卷 / 21期
关键词：
X-ray diffraction (XRD); transmission electron microscopy (TEM); aluminum oxide; sputtering;
D O I：
10.1016/j.tsf.2008.03.038
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
We employ textured alpha-Cr2O3 thin films as templates for growth of alpha-Al2O3 by reactive inductively coupled plasma magnetron sputtering. The texture of the template has a strong influence on the nucleation and growth of alpha-Al2O3. Extended growth of alpha-Al2O3 at a substrate temperature of 450 degrees C is obtained using a predominantly [10 (1) over bar4]-textured alpha-Cr2O3 template layer, while only limited alpha-Al2O3 nucleation is seen on a [0001]-textured alpha-Cr2O3 template. (C) 2008 Elsevier B.V. All rights reserved.
引用
收藏
页码：7447 / 7450
页数：4
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