Comparison of RF and Pulsed Magnetron Sputtering for the Deposition of AZO Thin Films on PET

被引:0
作者
Oliveira, L. P. G. [1 ]
Ramos, R. [1 ]
Rabelo, W. H. [1 ]
Rangel, E. C. [1 ]
Durrant, Steven F. [1 ]
Bortoleto, J. R. R. [1 ]
机构
[1] Univ Estadual Paulista, UNESP, Inst Ciencia & Tecnol Sorocaba ICTS, Av Tres Marco 511, BR-18087180 Sorocaba, SP, Brazil
来源
MATERIALS RESEARCH-IBERO-AMERICAN JOURNAL OF MATERIALS | 2020年 / 23卷 / 03期
基金
巴西圣保罗研究基金会;
关键词
TCO; zinc oxide; PET; magnetron sputtering; ZINC-OXIDE; AL; TRANSPARENT; THICKNESS; PERFORMANCE; PRESSURE; POWER; DC;
D O I
10.1590/1980-5373-MR-2019-0643
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
AZO thin films (around 200 nm thick) were grown on polyethylene terephthalate (PET) at room temperature. The plasma was activated using a 13.56 MHz (RF) or a 15 kHz pulsed (PMS) source at a power of 60 W. Optical reflection and transmittance were measured using a UV-Vis-NIR spectrometer over the wavelengths from 190 nm to 2500 nm. All samples show average transmittances greater than 83% in the visible region. The electrical resistivity was measured by the linear four-point probe method to be around 0.001 Omega cm for 200 nm-thick AZO films grown by PMS. XRD results indicated that the films had a hexagonal wurtzite structure and were preferentially oriented in the (002) plane. The surface morphology of the AZO thin films was characterized using Scanning Electron Microscopy (SEM); film chemical composition was studied using Energy Dispersive X-ray Spectroscopy (EDS). For this, an EDS coupled to the Scanning Electron Microscope was used. Only for films grown by PMS were no cracks observed.
引用
收藏
页数:6
相关论文
共 50 条
[31]   Properties of ITO films deposited by RF superimposed DC magnetron sputtering [J].
Kim, Se Il ;
Cho, Sang Hyun ;
Choi, Sung Ryong ;
Yoon, Han Ho ;
Song, Pung Keun .
CURRENT APPLIED PHYSICS, 2009, 9 :S262-S265
[32]   Fractal and statistical characterization of Ti thin films deposited by RF-magnetron sputtering: The effects of deposition time [J].
Astinchap, Bandar .
OPTIK, 2019, 178 :231-242
[33]   Physical properties of metal-doped ZnO thin films prepared by RF magnetron sputtering at room temperature [J].
Mahdhi, Hayet ;
Ben Ayadi, Z. ;
Djessas, K. .
JOURNAL OF SOLID STATE ELECTROCHEMISTRY, 2019, 23 (12) :3217-3224
[34]   Pulsed rf magnetron sputtered alumina thin films [J].
Reddy, I. Neelakanta ;
Reddy, V. Rajagopal ;
Sridhara, N. ;
Rao, V. Sasidhara ;
Bhattacharya, Manjima ;
Bandyopadhyay, Payel ;
Basavaraja, S. ;
Mukhopadhyay, Anoop Kumar ;
Sharma, Anand Kumar ;
Dey, Arjun .
CERAMICS INTERNATIONAL, 2014, 40 (07) :9571-9582
[35]   Antibacterial property of CuCrO2 thin films prepared by RF magnetron sputtering deposition [J].
Chiu, Te-Wei ;
Yang, Yung-Chin ;
Yeh, An-Chou ;
Wang, Yung-Po ;
Feng, Yi-Wei .
VACUUM, 2013, 87 :174-177
[36]   Effect of Deposition Time on Properties of Nanostructured ZnO Thin Films Deposited by RF Magnetron Sputtering [J].
Sin, N. D. Md ;
Mamat, M. H. ;
Rusop, M. .
NANOSCIENCE, NANOTECHNOLOGY AND NANOENGINEERING, 2014, 832 :460-465
[37]   Structural and optical characterization of Cu doped ZnO thin films deposited by RF magnetron sputtering [J].
Toma, Maria ;
Ursulean, Nicolae ;
Marconi, Daniel ;
Pop, Aurel .
JOURNAL OF ELECTRICAL ENGINEERING-ELEKTROTECHNICKY CASOPIS, 2019, 70 (07) :127-131
[38]   Influence of Substrate Temperature on the Properties of Nanostructured ZnO Thin Films Grown by RF Magnetron Sputtering [J].
Mahdhi, H. ;
Ben Ayadi, Z. ;
Gauffier, J. L. ;
Djessas, K. .
JOURNAL OF ELECTRONIC MATERIALS, 2016, 45 (01) :557-565
[39]   CHARACTERIZATION OF AlGaAs THIN FILMS PREPARED BY RF MAGNETRON SPUTTERING [J].
Losada-Losada, Juan D. ;
Pulzara-Mora, Alvaro .
MOMENTO-REVISTA DE FISICA, 2018, (57) :50-59
[40]   Oxygen Effect on Structural and Optical Properties of ZnO Thin Films Deposited by RF Magnetron Sputtering [J].
Abdallah, Bassam ;
Jazmati, Abdul Kader ;
Refaai, Raeda .
MATERIALS RESEARCH-IBERO-AMERICAN JOURNAL OF MATERIALS, 2017, 20 (03) :607-612