Expansion of the working range of forevacuum plasma electron sources toward higher pressures

被引:12
作者
Burdovitsin, V. A. [1 ]
Goreev, A. K. [1 ]
Klimov, A. S. [1 ]
Zenin, A. A. [1 ]
Oks, E. M. [1 ]
机构
[1] Tomsk State Univ Control Syst & Radioelect, Tomsk 634050, Russia
基金
俄罗斯基础研究基金会;
关键词
Electron Beam; Glow Discharge; Hollow Cathode; Electron Source; Beam Plasma;
D O I
10.1134/S1063784212080075
中图分类号
O59 [应用物理学];
学科分类号
摘要
It is shown that the pressure in forevacuum plasma electron sources is limited from above by a current component that arises in the accelerating gap from a high-voltage glow discharge and dominates in the electron beam. The working pressure range of such electron sources can be expanded toward higher pressures by limiting the current of the high-voltage glow discharge in the accelerating gap.
引用
收藏
页码:1101 / 1105
页数:5
相关论文
共 9 条
[1]   On the possibility of electron-beam processing of dielectrics using a forevacuum plasma electron source [J].
Burdovitsin, V. A. ;
Klimov, A. S. ;
Oks, E. M. .
TECHNICAL PHYSICS LETTERS, 2009, 35 (06) :511-513
[2]   Fore-vacuum plasma-cathode electron sources [J].
Burdovitsin, V. A. ;
Oks, E. M. .
LASER AND PARTICLE BEAMS, 2008, 26 (04) :619-635
[3]  
BURDOVITSIN VA, 2005, PRIB TEKH EKSP, V6, P66
[4]   HIGH-PRESSURE ARCS AS VACUUM-ATMOSPHERE INTERFACE AND PLASMA LENS FOR NONVACUUM ELECTRON-BEAM WELDING MACHINES, ELECTRON-BEAM MELTING, AND NONVACUUM ION MATERIAL MODIFICATION [J].
HERSHCOVITCH, A .
JOURNAL OF APPLIED PHYSICS, 1995, 78 (09) :5283-5288
[5]  
KREINDEL YE, 1977, PLASMA ELECT SOURCES
[6]  
Kreindel' Yu. E., 1971, TECH PHYS, V26, P11
[7]  
Oks E., 2007, Plasma Cathode Electron Sources: Physics, Technology, Applications
[8]   A plasma-cathode electron source designed for industrial use [J].
Osipov, I ;
Rempe, N .
REVIEW OF SCIENTIFIC INSTRUMENTS, 2000, 71 (04) :1638-1641
[9]  
Zav'yalov M. A., 1989, Plasma Processes in Technological Electron Guns