Thermal decomposition of alkyl monolayers covalently grafted on (111) silicon

被引：27
|
作者：
Faucheux, A.
Yang, F.
Allongue, P.
De Villeneuve, C. Henry
Ozanam, F.
Chazalviel, J. -N. [1 ]
机构：
[1] Ecole Polytech, CNRS, Phys Mat Condensee Lab, F-91128 Palaiseau, France
[2] STMicroelect, F-38926 Crolles, France
来源：
APPLIED PHYSICS LETTERS | 2006年 / 88卷 / 19期
关键词：
D O I：
10.1063/1.2202125
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Alkyl monolayers have been covalently grafted onto atomically flat (111) hydrogenated silicon surfaces through hydrosilylation of 1-alkenes. The thermal stability of the layers under oxidizing or reducing atmospheres has been investigated by quantitative in situ infrared spectroscopy, using a specially designed variable-temperature cell. The layers are thermally stable up to 250 degrees C. In the range of 250-300 degrees C, the main reaction is alkene desorption accompanied with silicon oxidation. The characteristic desorption temperature is not significantly affected by changing the atmosphere, the initial packing density of the layers, or the chain length from C-18 to C-6, but very short chains appear more stable. (c) 2006 American Institute of Physics.
引用
收藏
页数：3
相关论文
共 50 条
  • [1] Mechanisms of thermal decomposition of organic monolayers grafted on (111) silicon
    Faucheux, A.
    Gouget-Laemmel, A. C.
    Allongue, P.
    de Villeneuve, C. Henry
    Ozanam, F.
    Chazalviel, J. -N.
    LANGMUIR, 2007, 23 (03) : 1326 - 1332
  • [2] Thermal decomposition of alkoxy monolayers grafted on silicon: A mechanistic model
    Dusciac, D.
    de Villeneuve, C. Henry
    Allongue, P.
    Ozanam, F.
    Chazalviel, J. -N.
    SURFACE SCIENCE, 2013, 609 : 230 - 235
  • [3] Alkyl monolayers covalently bonded to silicon surfaces
    Linford, M.R.
    Chidsey, C.E.D.
    1600, (115):
  • [4] ALKYL MONOLAYERS COVALENTLY BONDED TO SILICON SURFACES
    LINFORD, MR
    CHIDSEY, CED
    JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1993, 115 (26) : 12631 - 12632
  • [5] Thermal stability of alkoxy monolayers grafted on Si(111)
    Dusciac, Dorin
    Chazalviel, Jean-Noel
    Ozanam, Francois
    Allongue, Philippe
    de Villeneuve, Catherine Henry
    SURFACE SCIENCE, 2007, 601 (18) : 3961 - 3964
  • [6] Thermal stability of covalently bound monolayers on porous silicon
    Coon, Shoshanna R.
    Cunningham, Robert S.
    Mavour, Davenne L.
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2006, 231
  • [7] Water exclusion at the nanometer scale provides long-term passivation of silicon(111) grafted with alkyl monolayers
    Gorostiza, P
    de Villeneuve, CH
    Sun, QY
    Sanz, F
    Wallart, X
    Boukherroub, R
    Allongue, P
    JOURNAL OF PHYSICAL CHEMISTRY B, 2006, 110 (11): : 5576 - 5585
  • [8] Nanopatterning of alkyl monolayers covalently bound to Si(111) with an atomic force microscope
    Ara, M
    Graaf, H
    Tada, H
    APPLIED PHYSICS LETTERS, 2002, 80 (14) : 2565 - 2567
  • [9] Thermal behavior of alkyl monolayers on silicon surfaces
    Sung, MM
    Kluth, GJ
    Yauw, OW
    Maboudian, R
    LANGMUIR, 1997, 13 (23) : 6164 - 6168
  • [10] Thermal behavior of alkyl monolayers on silicon surfaces
    Sung, Myung M.
    Kluth, G.Jonathan
    Yauw, Oranna W.
    Maboudian, Roya
    1997, ACS, Washington, DC, United States (13)
12345