Thermoelectric Properties Of SiO2/SiO2+Au Nano-Layered Superlattices Modified By MeV Si Ions Beam
被引:4
作者:
Chacha, J.
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机构:
Alabama A&M Univ, Dept Elect Engn, 4900 Meridian St, Normal, AL 35762 USAAlabama A&M Univ, Dept Elect Engn, 4900 Meridian St, Normal, AL 35762 USA
Chacha, J.
[1
]
Budak, S.
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机构:
Alabama A&M Univ, Dept Elect Engn, 4900 Meridian St, Normal, AL 35762 USAAlabama A&M Univ, Dept Elect Engn, 4900 Meridian St, Normal, AL 35762 USA
Budak, S.
[1
]
Smith, C.
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机构:
Alabama A&M Univ, Cent Irradiat Mat, Normal, AL 35762 USAAlabama A&M Univ, Dept Elect Engn, 4900 Meridian St, Normal, AL 35762 USA
Smith, C.
[2
]
McElhaney, D.
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机构:
Alabama A&M Univ, Dept Elect Engn, 4900 Meridian St, Normal, AL 35762 USAAlabama A&M Univ, Dept Elect Engn, 4900 Meridian St, Normal, AL 35762 USA
McElhaney, D.
[1
]
Pugh, M.
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Alabama A&M Univ, Dept Elect Engn, 4900 Meridian St, Normal, AL 35762 USAAlabama A&M Univ, Dept Elect Engn, 4900 Meridian St, Normal, AL 35762 USA
Pugh, M.
[1
]
Ogbara, K.
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机构:
Alabama A&M Univ, Dept Phys, Normal, AL 35762 USAAlabama A&M Univ, Dept Elect Engn, 4900 Meridian St, Normal, AL 35762 USA
Ogbara, K.
[3
]
Heidary, K.
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机构:
Alabama A&M Univ, Dept Elect Engn, 4900 Meridian St, Normal, AL 35762 USAAlabama A&M Univ, Dept Elect Engn, 4900 Meridian St, Normal, AL 35762 USA
Heidary, K.
[1
]
Johnson, R. B.
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机构:
Alabama A&M Univ, Dept Phys, Normal, AL 35762 USAAlabama A&M Univ, Dept Elect Engn, 4900 Meridian St, Normal, AL 35762 USA
Johnson, R. B.
[3
]
Muntele, C.
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机构:
Alabama A&M Univ, Cent Irradiat Mat, Normal, AL 35762 USAAlabama A&M Univ, Dept Elect Engn, 4900 Meridian St, Normal, AL 35762 USA
Muntele, C.
[2
]
Ila, D.
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h-index: 0
机构:
Alabama A&M Univ, Cent Irradiat Mat, Normal, AL 35762 USAAlabama A&M Univ, Dept Elect Engn, 4900 Meridian St, Normal, AL 35762 USA
Ila, D.
[2
]
机构:
[1] Alabama A&M Univ, Dept Elect Engn, 4900 Meridian St, Normal, AL 35762 USA
[2] Alabama A&M Univ, Cent Irradiat Mat, Normal, AL 35762 USA
[3] Alabama A&M Univ, Dept Phys, Normal, AL 35762 USA
来源:
APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY: TWENTY-FIRST INTERNATIONAL CONFERENCE
|
2011年
/
1336卷
基金:
美国国家科学基金会;
关键词:
Ion bombardment;
thermoelectric properties;
multi-nanolayers;
Rutherford backscattering;
Figure of merit;
D O I:
10.1063/1.3586099
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
The efficiency of thermoelectric devices and materials is limited by the properties of n- and p-type (semi) conductors. Effective thermoelectric materials have a low thermal conductivity and a high electrical conductivity. The performance of thermoelectric materials and devices is shown by a dimensionless figure of merit, The performance of thermoelectric materials and devices is shown by a dimensionless figure of merit, ZT = S-2 sigma T/K, where S is the Seebeck coefficient, sigma is the electrical conductivity, T is the absolute temperature and K is the thermal conductivity. ZT can be increased by both increasing S and. sigma or decreasing K. In this study we have prepared a thermoelectric generator from 100 alternating layers of SiO2/SiO2+Au superlattice films using ion beam assisted deposition (IBAD). In order to determine the stoichiometry of SiO2 and Au in the grown multilayer films, Rutherford Backscattering Spectrometry (RBS) was used. The 5 MeV Si ions bombardment was performed using the CIM Pelletron ion beam accelerator to make nanodots and/or nanoclusters in the multi-layer superlattice thin films to decrease the cross plane thermal conductivity, increase the cross plane Seebeck coefficient and increase the cross plane electrical conductivity.