METHODIC OF THIN TUNGSTEN AND NICKEL FILMS PREPARATION BY GLANCING ANGLE DEPOSITION

The glancing angle deposition (GLAD) technique was used to deposit tungsten thin films by dc magnetron sputtering ant nickel thin films by thermal vaporizing. GLAD method was used in order to find the diferences in structure of thin films prepared by GLAD and by non-angular depositions. Dissimilar characteristics of the same materials can be found by controling the surface morphology and nanostructure. These features can be useful in a number of directions, e. g. in creating catalyst materials, sensors, detectors. The evolution of surface topography of tungsten and nickel thin films was examined by scanning electron microscope (SEM).