Hydrogen molecules trapped by multivacancies in silicon

被引:37
作者
Ishioka, K
Kitajima, M
Tateishi, S
Nakanoya, K
Fukata, N
Mori, T
Murakami, K
Hishita, S
机构
[1] Natl Res Inst Met, Tsukuba, Ibaraki 305, Japan
[2] Univ Tsukuba, Inst Mat Sci, Tsukuba, Ibaraki 305, Japan
[3] Natl Inst Res Inorgan Mat, Tsukuba, Ibaraki 305, Japan
来源
PHYSICAL REVIEW B | 1999年 / 60卷 / 15期
关键词
D O I
10.1103/PhysRevB.60.10852
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We report an observation of a Raman line of H-2 in silicon after Si+-ion implantation followed by a hydrogen atom treatment. The vibrational frequency of the H-2 is 3822 cm(-1) between the two different vibrational frequencies, 4158 and 3601 cm(-1), of H-2 observed so far in silicon. The assignment is confirmed by the observation of isotope shifts to 2770 cm(-1) for D-2 and to 3353 cm(-1) for HD. The ion-fluence dependence of the Raman intensity of the H-2 at 3822 cm(-1) correlates with the total intensity of peaks in the Si-H stretching region that are attributed to H-terminated dangling bonds in multivacancies and/or interstitial-H complexes. We propose that the hydrogen molecule corresponding to the 3822 cm(-1) vibrational line is trapped in or adjacent to H-terminated multivacancies. [S0163-1829(99)12739-5].
引用
收藏
页码:10852 / 10854
页数:3
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