A radom model of twin film growth

被引:17
作者
Liu, ZL [1 ]
Wei, HL [1 ]
Wang, HW [1 ]
Wang, JZ [1 ]
机构
[1] Huazhong Univ Sci & Technol, Dept Phys, Wuhan 430074, Peoples R China
关键词
D O I
10.7498/aps.48.1302
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The relationship between temperature of substrate and island morphology at the early phase of thin film growth has been investigated using Monte Carlo model. The relationship between island morphology and rest energy of vapor phase particles has also been obtained. Three kinds of dynamic processes, i. e. adsorption, diffusion and desorption are considered. The difference between our model and the previous one is that the impingement is considered to be independent of other processes, and the diffusion and desorption are correlated with each other. The results indicate that with increasing temperature, the island morphology evolves from dispersed growth, fractal growth to dense growth. At low temperatures, with increasing energy of vapor phase particles, the same evolution of island morphology is also observed.
引用
收藏
页码:1302 / 1308
页数:7
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