Special Issue: 15 Years of SU8 as MEMS Material

被引：18
作者：
Bertsch, Arnaud [1 ]
Renaud, Philippe [1 ]
机构：
[1] Ecole Polytech Fed Lausanne, Microsyst Lab LMIS4, CH-1015 Lausanne, Switzerland
来源：
MICROMACHINES | 2015年 / 6卷 / 06期
关键词：
HIGH-ASPECT-RATIO; SU-8; MICROSTRUCTURES; PHOTORESIST; ULTRATHICK; COMPOSITE;
D O I：
10.3390/mi6060790
中图分类号：
O65 [分析化学];
学科分类号：
070302 ; 081704 ;
摘要：
引用
收藏
页码：790 / 792
页数：3
相关论文
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