Reactive sputtering TiO2 films for surface coating of poly (dimethylsiloxane)

被引:19
|
作者
Niu, ZQ [1 ]
Jia, XY [1 ]
Zhang, WP [1 ]
Chen, WY [1 ]
Qian, KY [1 ]
机构
[1] Shanghai Jiao Tong Univ, Key Lab Thin Film & Micro Fabricat Technol, Minist Educ, Res Inst Micro Nanometer Sci & Technol, Shanghai 200030, Peoples R China
关键词
PDMS; TiO2; films; reactive sputtering; surface coating; XPS; contact angle; protein adsorption;
D O I
10.1016/j.apsusc.2005.04.014
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Titanium dioxide (TiO2) films were prepared on poly(dimethylsiloxane) (PDMS) substrate by direct current (DC) reactive sputtering to change surface physical properties of PDMS. The effects of the changes were investigated by using X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) analysis, water contact angle measurements and protein adsorption tests. Improved wettability and reduced adsorption properties were observed on PDMS surface coated TiO2 films. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:2259 / 2264
页数:6
相关论文
共 50 条
  • [1] Synthesis studies of sputtering TiO2 films on poly(dimethylsiloxane) for surface modification
    Niu, ZQ
    Gao, F
    Jia, XY
    Zhang, WP
    Chen, WY
    Qian, KY
    COLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS, 2006, 272 (03) : 170 - 175
  • [2] Surface Coating of TiO2 Powder
    Zhang, Peixin
    Zhang, Dongyun
    Qiu, Qi
    Jing, Li
    Ren, Xiangzhong
    POWDER TECHNOLOGY AND APPLICATION, 2009, 58 : 183 - +
  • [3] Investigations of TiO2 films prepared by reactive magnetron sputtering
    Zhao, K
    Zhu, F
    Wang, LF
    Meng, TJ
    Zhang, BC
    Zhao, K
    ACTA PHYSICA SINICA, 2001, 50 (07) : 1390 - 1395
  • [4] High rate reactive deposition of TiO2 films using two sputtering sources
    Hoshi, Yoichi
    Ishihara, Daiki
    Sakai, Tetsuya
    Kamiya, Osamu
    Lei, Hao
    VACUUM, 2010, 84 (12) : 1377 - 1380
  • [5] Effect of deposition parameters on properties of TiO2 films deposited by reactive magnetron sputtering
    Wang, Bo
    Wei, Shicheng
    Guo, Lei
    Wang, Yujiang
    Liang, Yi
    Xu, Binshi
    Pan, Fusheng
    Tang, Aitao
    Chen, Xianhua
    CERAMICS INTERNATIONAL, 2017, 43 (14) : 10991 - 10998
  • [6] Original Effect of sputtering power on microstructure and corrosion properties of TiO2 films deposited by reactive magnetron sputtering
    Wang, Bo
    Wei, Shicheng
    Guo, Lei
    Wang, Yujiang
    Liang, Yi
    Huang, Wei
    Lu, Fangjie
    Chen, Xianhua
    Pan, Fusheng
    Xu, Binshi
    JOURNAL OF MATERIALS RESEARCH AND TECHNOLOGY-JMR&T, 2022, 19 : 2171 - 2178
  • [7] Structural and surface properties of TiO2 thin films doped with neodymium deposited by reactive magnetron sputtering
    Mazur, Michal
    Kaczmarek, Danuta
    Domaradzki, Jaroslaw
    Wojcieszak, Damian
    Mazur, Piotr
    Prociow, Eugeniusz
    MATERIALS SCIENCE-POLAND, 2013, 31 (01) : 71 - 79
  • [8] Surface characterization of TiO2 thin films obtained by high-energy reactive magnetron sputtering
    Wasielewski, R.
    Domaradzki, J.
    Wojcieszak, D.
    Kaczmarek, D.
    Borkowska, A.
    Prociow, E. L.
    Ciszewski, A.
    APPLIED SURFACE SCIENCE, 2008, 254 (14) : 4396 - 4400
  • [9] Effect of the substrate temperature on the crystallization of TiO2 films prepared by DC reactive magnetron sputtering
    Zhang, Yuanyuan
    Ma, Xiangyang
    Chen, Peiliang
    Yang, Deren
    JOURNAL OF CRYSTAL GROWTH, 2007, 300 (02) : 551 - 554
  • [10] Characterization and wettability of TiO2 films deposited by mid-frequency magnetron reactive sputtering
    Cui, Ying
    Du, Hao
    Lee, Soo Wohn
    Sun, Chao
    Wen, Lishi
    ECO-MATERIALS PROCESSING AND DESIGN VIII, 2007, 544-545 : 27 - +