High resolution wavefront measurement of aspheric optics

被引：3
|
作者：
Erichsen, I. [1 ]
Krey, S. [1 ]
Heinisch, J. [1 ]
Ruprecht, A. [1 ]
Dumitrescu, E. [1 ]
机构：
[1] Triopt GmbH, D-22880 Wedel, Germany
来源：
CURRENT DEVELOPMENTS IN LENS DESIGN AND OPTICAL ENGINEERING IX | 2008年 / 7060卷
关键词：
Aspheric lenses; Shack-Hartmann; Wavefront; Wafer; WaveMaster; EFL; FFL;
D O I：
10.1117/12.794467
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
With the recently emerged large volume production of miniature aspheric lenses for a wide range of applications, a new fast fully automatic high resolution wavefront measurement instrument has been developed. The Shack-Hartmann based system with reproducibility better than 0.05 waves is able to measure highly aspheric optics and allows for real time comparison with design data. Integrated advanced analysis tools such as calculation of Zernike coefficients, 2D-Modulation Transfer Function (MTF), Point Spread Function (PSF), Strehl-Ratio and the measurement of effective focal length (EFL) as well as flange focal length (FFL) allow for the direct verification of lens properties and can be used in a development as well as in a production environment.
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收藏
页数：7
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