Structural and optical properties of tellurium films obtained by chemical vapor deposition(CVD)

被引：2

作者：

Ma Yu-tian ^{[1
]}

Gong Zhu-qing

Xu Wei-hong

Huang Jian

机构：

[1] Cent S Univ, Sch Met Sci & Engn, Changsha 410083, Peoples R China

[2] Jinchuan Grp Ltd, Jinchang 737100, Peoples R China

来源：

TRANSACTIONS OF NONFERROUS METALS SOCIETY OF CHINA | 2006年 / 16卷 / 03期

基金：

中国国家自然科学基金;

关键词：

tellurium thin film; chemical vapor deposition; solar radiation shields; radiative cooling;

D O I：

10.1016/S1003-6326(06)60123-4

中图分类号：

TF [冶金工业];

学科分类号：

0806 ;

摘要：

Tellurium thin films were prepared by the chemical vapor deposition method. The structure, surface morphology and optical properties of the Te thin films were analyzed by powder X-ray diffraction, scanning electron microscopy, FTIR transmission, UV/VIS/NIR transmission and reflectance. The results show that the films structural and optical properties are influenced by many factors such as film thickness, crystallite size and substrate temperature. The films as thick as 111-133 nm have high IR transmission across the full 8-13 mu m band and highly blocking in the solar spectral region elsewhere, which indicates that Te films thickness in this region can be used as good solar radiation shields in radiative cooling devices.

引用

页码：693 / 699

页数：7

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