Electronic transport and device prospects of monolayer molybdenum disulphide grown by chemical vapour deposition

被引:353
作者
Zhu, Wenjuan [1 ]
Low, Tony [1 ]
Lee, Yi-Hsien [2 ]
Wang, Han [1 ]
Farmer, Damon B. [1 ]
Kong, Jing [3 ]
Xia, Fengnian [4 ]
Avouris, Phaedon [1 ]
机构
[1] IBM Corp, Thomas J Watson Res Ctr, Yorktown Hts, NY 10598 USA
[2] Natl Tsing Hua Univ, Dept Mat Sci & Engn, Hsinchu 30013, Taiwan
[3] MIT, Dept Elect Engn & Comp Sci, Boston, MA 02139 USA
[4] Yale Univ, Dept Elect Engn, New Haven, CT 06511 USA
来源
NATURE COMMUNICATIONS | 2014年 / 5卷
关键词
FIELD-EFFECT TRANSISTORS; THIN-FILM TRANSISTORS; MOS2 ATOMIC LAYERS; LARGE-AREA; HIGH-PERFORMANCE; PHASE GROWTH; MOBILITY; TRANSITION; STATES;
D O I
10.1038/ncomms4087
中图分类号
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号
07 ; 0710 ; 09 ;
摘要
Layered transition metal dichalcogenides display a wide range of attractive physical and chemical properties and are potentially important for various device applications. Here we report the electronic transport and device properties of monolayer molybdenum disulphide grown by chemical vapour deposition. We show that these devices have the potential to suppress short channel effects and have high critical breakdown electric field. However, our study reveals that the electronic properties of these devices are at present severely limited by the presence of a significant amount of band tail trapping states. Through capacitance and ac conductance measurements, we systematically quantify the density-of-states and response time of these states. Because of the large amount of trapped charges, the measured effective mobility also leads to a large underestimation of the true band mobility and the potential of the material. Continual engineering efforts on improving the sample quality are needed for its potential applications.
引用
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页数:8
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