Annealing Effect on the Stability of Platinum Thin Films Covered by SiO2 or SiNx Layer

被引:0
|
作者
Xiao, Li [1 ]
Zhao, Zhan [1 ]
Du, Lidong [1 ]
Wu, Shaohua [1 ]
Liu, Qimin [1 ]
机构
[1] Chinese Acad Sci, Inst Elect, State Key Lab Transducer Technol, Beijing, Peoples R China
关键词
component; Platinum; Annealing; Pressure sensor; Resistance;
D O I
暂无
中图分类号
R318 [生物医学工程];
学科分类号
0831 ;
摘要
This study examined the crystal structure and the surface morphology between Pt and SiO2 or SiNx as a glue layer according to the annealing treatment. The thermal temperature make the surface morphology of the Pt films changed, and the characteristics of Pt thin film resistors under different annealing temperature also been changed. The resistance of the film will decrease after thermal treatment which the annealing temperature is lower than 480 degrees C, and the resistor will increase sharply after annealing above 500 degrees C. SiO2 or SiNx layers covered on Pt thin films also have an effect on the characteristics of Pt thin films.
引用
收藏
页码:352 / 355
页数:4
相关论文
共 50 条
  • [1] Enhancement of visible photoluminescence in the SiNx films by SiO2 buffer and annealing
    Xu, M.
    Xu, S.
    Chai, J. W.
    Long, J. D.
    Ee, Y. C.
    APPLIED PHYSICS LETTERS, 2006, 89 (25)
  • [2] Organic thin film transistors with a SiO2/SiNx/SiO2 composite insulator layer
    刘向
    刘惠
    半导体学报, 2011, 32 (03) : 54 - 56
  • [3] Organic thin film transistors with a SiO2/SiNx/SiO2 composite insulator layer
    Xiang, Liu
    Hui, Liu
    JOURNAL OF SEMICONDUCTORS, 2011, 32 (03)
  • [4] Effect of annealing on Ge-doped SiO2 thin films
    Fujimaki, M
    Shimoto, S
    Miyazaki, N
    Ohki, Y
    Seol, KS
    Imamura, K
    JOURNAL OF APPLIED PHYSICS, 1999, 86 (09) : 5270 - 5273
  • [5] The effect of upper layer in optical capacitor based on SiO2/SiNx/SiO2/Si structure
    Parkhomenko, I
    Vlasukova, L.
    Romanov, I
    Komarov, F.
    Mudryi, A.
    Kovalchuk, N.
    Demidovich, S.
    OPTICAL MATERIALS, 2022, 127
  • [6] Effect of Thermal Annealing on Double Anti Reflection Coating SiNx/SiO2
    Meziani, Samir
    Moussi, Abderrahmane
    Mahiou, Linda
    Outemzabet, Ratiba
    PROCEEDINGS OF 2015 3RD IEEE INTERNATIONAL RENEWABLE AND SUSTAINABLE ENERGY CONFERENCE (IRSEC'15), 2015, : 11 - 15
  • [7] Effect of hydrogen on the device performance and stability characteristics of amorphous InGaZnO thin-film transistors with a SiO2/SiNx/SiO2 buffer
    Han, Ki-Lim
    Ok, Kyung-Chul
    Cho, Hyeon-Su
    Oh, Saeroonter
    Park, Jin-Seong
    APPLIED PHYSICS LETTERS, 2017, 111 (06)
  • [8] Effect of annealing temperature on binary TiO2:SiO2 nanocrystalline thin films
    Mei, F.
    Liu, C.
    Zhou, L.
    Zhao, W. K.
    Fang, Y. L.
    Wang, J. B.
    Ren, Y. Y.
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2006, 48 (06) : 1509 - 1513
  • [9] Effect of SiO2 Layer Thickness on SiO2/Si3N4 Multilayered Thin Films
    Huang, Ziming
    Duan, Jiaqi
    Li, Minghan
    Ma, Yanping
    Jiang, Hong
    COATINGS, 2024, 14 (07)
  • [10] Fabrication and characterization of uniform conformal thin films of SiO2 and SiNx on optical fibers
    Green, Mark
    Naqvi, Zeba
    Smith, Krista
    Her, Tsing-Hua
    2014 11TH ANNUAL HIGH CAPACITY OPTICAL NETWORKS AND EMERGING/ENABLING TECHNOLOGIES (PHOTONICS FOR ENERGY), 2014, : 229 - 233