共 5 条
[1]
Design of an etch-resistant cyclic olefin photoresist
[J].
ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XV, PTS 1 AND 2,
1998, 3333
:463-471
[2]
Lithographic performance of a dry-etch stable methacrylate resist at 193 nm
[J].
ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XV, PTS 1 AND 2,
1998, 3333
:144-151
[3]
193nm single-layer photoresists based on alternating copolymers of cycloolefins: the use of photogenerators of sulfamic acids
[J].
ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XV, PTS 1 AND 2,
1998, 3333
:73-82
[4]
Design of cycloolefin maleic anhydride resist for ArF lithography
[J].
ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XV, PTS 1 AND 2,
1998, 3333
:11-25
[5]
ArF single layer photoresists based on alkaline-developable ROMP-H resin
[J].
ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XV, PTS 1 AND 2,
1998, 3333
:26-31