Robust Methodology for Low-Frequency Noise Power Analyses in Advanced MOS Transistors

被引:2
|
作者
van Brandt, Leopold [1 ]
Esfeh, Babak Kazemi [1 ]
Kilchytska, Valeriya [1 ]
Flandre, Denis [1 ]
机构
[1] Catholic Univ Louvain, ICTEAM, Louvain La Neuve, Belgium
来源
2019 JOINT INTERNATIONAL EUROSOI WORKSHOP AND INTERNATIONAL CONFERENCE ON ULTIMATE INTEGRATION ON SILICON (EUROSOI-ULIS) | 2019年
关键词
MOSFETS; BIAS;
D O I
10.1109/eurosoi-ulis45800.2019.9041859
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We present a newmethodology to discriminate random telegraph noise (RTN) and flicker (1/f) noise components from set-up noise.We illustrate it for a strong RTN case (Delta I-D/I-D approximate to 30%) measured on a 26 nm gate length nMOS transistor. The approach is based on high-accuracy time-domain measurements. An iterative Schmitt trigger-like algorithm was developed to properly identify and model the RTN and 1/f noise. Statistical analysis allows to assess the accuracy of the extraction. The power spectral densities (PSD) of the different noise models accurately match the frequency measurements.
引用
收藏
页数:4
相关论文
共 50 条
  • [31] Low-Frequency Noise in Asymmetric Self-Cascode FD SOI nMOSFETs
    Assalti, R.
    Doria, R. T.
    Pavanello, M. A.
    de Souza, M.
    Flandre, D.
    2016 31ST SYMPOSIUM ON MICROELECTRONICS TECHNOLOGY AND DEVICES (SBMICRO), 2016,
  • [32] Low-frequency noise in high-k gate dielectric nanoscale MOSFETs
    Han, I. K.
    Nam, H. D.
    Choi, W. J.
    Lee, J. I.
    Szentpali, B.
    Chovet, A.
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2006, 49 (03) : 1117 - 1120
  • [33] Analysis of the Low-Frequency Noise in Graded-Channel and Standard SOI nMOSFET
    da Silva, E. L. R.
    Miguez, M.
    de Souza, M.
    Arnaud, A.
    Pavanello, M. A.
    MICROELECTRONICS TECHNOLOGY AND DEVICES - SBMICRO 2010, 2010, 31 (01): : 359 - 366
  • [34] Low-frequency noise in buried-channel SiGe n-MODFETs
    Madan, Anuj
    Cressler, John D.
    Koester, Steven J.
    SOLID-STATE ELECTRONICS, 2009, 53 (08) : 901 - 904
  • [35] Low Frequency Noise Performance of Advanced Si and Ge CMOS Technologies
    Claeys, C.
    Mercha, A.
    Simoen, E.
    NOISE AND FLUCTUATIONS, 2009, 1129 : 209 - 214
  • [36] Effect of body bias and temperature on low-frequency noise in 40-nm nMOSFETs
    Chiu, Hsien-Chin
    Chou, Min-Li
    Cheng, Chun-Hu
    Kao, Hsuan-Ling
    Cho, Cheng-Lin
    MICROELECTRONICS RELIABILITY, 2017, 78 : 267 - 271
  • [37] On the Variability and Front-Back Coupling of the Low-frequency Noise in UTBOX SOI nMOSFETs
    dos Santos, S. D.
    Simoen, E.
    Strobel, V.
    Cretu, B.
    Routoure, J. -M.
    Carin, R.
    Aoulaiche, M.
    Jurczak, M.
    Martino, J. A.
    Claeys, C.
    2012 IEEE 11TH INTERNATIONAL CONFERENCE ON SOLID-STATE AND INTEGRATED CIRCUIT TECHNOLOGY (ICSICT-2012), 2012, : 234 - 236
  • [38] Low-Frequency Noise Characteristics in SONOS Flash Memory With Vertically Stacked Nanowire FETs
    Bang, Tewook
    Lee, Byung-Hyun
    Kim, Choong-Ki
    Ahn, Dae-Chul
    Jeon, Seung-Bae
    Kang, Min-Ho
    Oh, Jae-Sub
    Choi, Yang-Kyu
    IEEE ELECTRON DEVICE LETTERS, 2017, 38 (01) : 40 - 43
  • [39] Low-frequency noise degradation caused by STI interface effects in SOI-MOSFETs
    Lee, H
    Lee, JH
    Shin, H
    Park, YJ
    Min, HS
    IEEE ELECTRON DEVICE LETTERS, 2001, 22 (09) : 449 - 451
  • [40] Low-Frequency Noise Due to Iron Impurity Centers in GaN-Based HEMTs
    Fleetwood, Daniel M.
    Li, Xun
    Zhang, En Xia
    Schrimpf, Ronald D.
    Pantelides, Sokrates T.
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2024, 71 (02) : 1024 - 1030