Liquid deposition approaches to self-assembled periodic nanomasks

被引：9

作者：

Faustini, Marco ^{[1
]}

Drisko, Glenna L. ^{[1
]}

Boissiere, Cedric ^{[1
]}

Grosso, David ^{[1
]}

机构：

[1] Univ Paris 06, UMR UPMC CNRS 7574, Coll France, F-75231 Paris, France

来源：

SCRIPTA MATERIALIA | 2014年 / 74卷

关键词：

Nanomask; Etching; Self-assembly; Liquid deposition; Nanopattern; BLOCK-COPOLYMER LITHOGRAPHY; SOL-GEL ROUTE; NANOELECTRODE ARRAYS; FEPT NANOPARTICLES; FABRICATION; FILMS; SILICON; NANOPATTERNS; MORPHOLOGY; EVOLUTION;

D O I：

10.1016/j.scriptamat.2013.07.029

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The fabrication of two-dimensional high-aspect-ratio nanostructures is becoming an important area of research for its technological implications, for example in photonics, fluidics and microelectronics. Nanopatterned layers prepared by liquid deposition methods and bottom-up approaches are emerging as good candidates due to the diversity of their structures and the fact that they can be applied to large surfaces. We discuss the recent developments of self-assembled nanomasks and how they can be exploited for efficient pattern transfer on silicon. (C) 2013 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.

引用

页码：13 / 18

页数：6

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