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Agglomeration dynamics of germanium islands on a silicon oxide substrate: A grazing incidence small-angle x-ray scattering study
被引:20
|作者:
Cheynis, F.
[1
]
Leroy, F.
[1
]
Passanante, T.
[1
]
Mueller, P.
[1
]
机构:
[1] Aix Marseille Univ, CNRS, CINaM UMR 7325, F-13288 Marseille, France
关键词:
IN-SITU;
EVOLUTION;
GROWTH;
GE;
D O I:
10.1063/1.4802843
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
Grazing-incidence small-angle X-ray scattering (GISAXS) and grazing-incidence X-ray diffraction techniques are used to characterise the thermally induced solid-state dewetting of Ge(001) thin films leading to the formation of 3D Ge islands. A quantitative analysis based on the Kolmogorov-Johnson-Mehl-Avrami model is derived. The main physical parameters controlling the dewetting (activation energy and kinetic pre-factors) are determined. Assuming that the dewetting is driven by surface/interface minimisation and limited by surface diffusion, the Ge surface self-diffusion reads as D(s,0)c(0) e(-Ea/(kBT)) similar to 3 x 10(18) e(-2.6 +/- 0.3 eV/(kBT)) nm(2)/s. GISAXS technique enables to reconstruct the mean Ge-island shape, including facets. (C) 2013 AIP Publishing LLC [http://dx.doi.org/10.1063/1.4802843]
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页数:4
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