Infrared absorption spectroscopy measurements of amorphous CNx films prepared in CH4/N2 r.f. discharge

被引：65
作者：
Mutsukura, N [1 ]
Akita, K [1 ]
机构：
[1] Tokyo Denki Univ, Fac Engn, Chiyoda Ku, Tokyo 101, Japan
来源：
THIN SOLID FILMS | 1999年 / 349卷 / 1-2期
关键词：
amorphous materials; infrared spectroscopy; nitrides; plasma processing and deposition;
D O I：
10.1016/S0040-6090(99)00237-0
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Amorphous carbon nitride (CNx) films were prepared in CH4/N-2 r.f. plasma, and were examined by means of IR absorption spectroscopy. The IR absorption bands associated with N-H (3200-3500 cm(-1)), C-H (2800-3000 cm(-1)), C=N (2100-2250 cm(-1)), and N-H and/or C=N (1500-1800 cm(-1)) bonds, were observed. The IR absorption band at 2100-2250 cm(-1) region was examined in more detail, and accordingly it was confirmed that this band contained five absorption peaks at around 2105, 2160, 2190, 2215 and 2245 cm(-1), which could be assigned to nitrile (-C=N) (2215 and 2245 cm(-1)) and isonitrile (-N=C) (2105, 2160 and 2190 cm(-1)) structures, respectively. (C) 1999 Elsevier Science S.A. All rights reserved.
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页码：115 / 119
页数：5
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