Simulation of heating of the target during high-power impulse magnetron sputtering

被引：9
作者：
Karzin, V. V. [1 ]
Komlev, A. E. [1 ]
Karapets, K. I. [1 ]
Lebedev, N. K. [1 ]
机构：
[1] St Petersburg Electrotech Univ, Dept Phys Elect & Technol, 5 Prof Popov St, St Petersburg 197376, Russia
来源：
SURFACE & COATINGS TECHNOLOGY | 2018年 / 334卷
基金：
俄罗斯科学基金会;
关键词：
HiPIMS; HiPIMS-EM; Hot target; Magnetron sputtering; Heating simulation; High-rate deposition; DEPOSITION; TEMPERATURE; ZR;
D O I：
10.1016/j.surfcoat.2017.11.049
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
This paper presents the solution of a thermal task connected with the titanium target's heating under the influence of high-power pulses during magnetron sputtering. It is well known that more than 90% of power is absorbed due to the cathode heating. During DCMS mode the heating is not substantial but situation changes radically in HiPIMS mode. Target's temperature can reach values of its material melting. In this case a flux, connected with the target's evaporation is being added to the physical sputtering. It leads to the deposition rate growth.
引用
收藏
页码：269 / 273
页数：5
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