193 nm resist composition using hybrid copolymers of cycloolefin/maleic anhydride (COMA)/Methacrylate.

A high performance 193 nm resist has been developed from a novel hybrid copolymer based on a cycloolefin-maleic anhydride and methacrylate (COMA/Methacrylate) polymer system. A variety of copolymers have been synthesized from t-butyl norbornene carboxylate (BNC), t-butyl tetracyclo[4.4.0.1. (2.6)1(7.10)] dodec-8-ene-3-carboxylate (TCDBC), t-butoxycarbonylmethyl tetracyclo[4.4.0.1.(2.6)1(7.10)]dodec-8-ene-3-carboxyl ate (BTCDC), and 5-[2-trifluoromethyl-1,1,1-trifluoro-2-hydroxypropyl]-2-norbornene (F1) and maleic anhydride (MA). The effect of the monomers and the ratio of monomers in the copolymer on lithographic performance studied. This paper will report the chemistry of the polymer platform and relative advantages and disadvantages of having certain monomers in terms of lithographic performance and line edge roughness, and post exposure bake sensitivity.