Atomistic wear in a single asperity sliding contact

被引：236

作者：

Gotsmann, Bernd ^{[1
]}

Lantz, Mark A. ^{[1
]}

机构：

[1] Zurich Res Lab, IBM Res GmbH, CH-8803 Zurich, Switzerland

来源：

PHYSICAL REVIEW LETTERS | 2008年 / 101卷 / 12期

关键词：

D O I：

10.1103/PhysRevLett.101.125501

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

Abrasive wear of sharp silicon tips sliding distances of up to 750 m on a polymeric surface is studied using atomic force microscopy. The data cannot be explained by conventional macroscopic wear models. We present a new model in which the barrier for breaking an atomic bond is lowered by the frictional stress acting on the contact. Quantitative agreement is obtained between the model and wear data for all load forces and sliding distances studied.

引用

页数：4

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