Low temperature enhancement of the magnetic anisotropy in Fe Si multilayers

被引：2
作者：
Zuberek, R
Fronc, K
Szymczak, R
Baran, M
Mosiniewicz-Szablewska, E
Gnatchenkob, SL
Chizhik, AB
Stobiecki, F
Szymczak, H
机构：
[1] Polish Acad Sci, Inst Phys, PL-02668 Warsaw, Poland
[2] Natl Acad Sci Ukraine, Inst Low Temp Phys & Engn, UA-310164 Kharkov, Ukraine
[3] Polish Acad Sci, Inst Mol Phys, PL-60179 Poznan, Poland
来源：
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 1999年 / 196卷
关键词：
magnetic anisotropy; Fe Si multilayers;
D O I：
10.1016/S0304-8853(98)00670-2
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The FMR and SQUID investigation of the magnetic anisotropy of Fe/Si multilayers are presented. The multilayers, with various thicknesses of iron and a thick layer of silicon (in order to eliminate the coupling between Fe layers), have been grown by DC sputtering on single crystal GaAs substrates. Low temperature enhancement of the easy-plane anisotropy, especially below 50 K, was observed. This anisotropy seems to be of magnetoelastic origin. The coercivity was shown to decrease with temperature. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：83 / 84
页数：2
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