Polishability of CERAFORM: Silicon carbide

被引：8

作者：

Ealey, MA

Wellman, JA

机构：

来源：

ADVANCED MATERIALS FOR OPTICS AND PRECISION STRUCTURES | 1996年 / 2857卷

关键词：

D O I：

10.1117/12.258290

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Recent advances in polishing the bare CERAFORM SiC surface to finishes as smooth as 10 Angstrom rms has enhanced the viability of SIC as a mirror material those applications requiring thermal stability over a broad temperature range. In addition PVD silicon claddings have been developed to provide a low cost polishing option for more environments which are less severe. With the ability to make complex shapes in sizes up to 1 meter, CERAFORM SiC provides a cost-effective alternative to beryllium and glass.

引用

页码：78 / 85

页数：8