Analysis Of The Interface And Its Position In C60n+ Secondary Ion Mass Spectrometry Depth Profiling

被引:27
作者
Green, F. M. [1 ]
Shard, A. G. [1 ]
Gilmore, I. S. [1 ]
Seah, M. P. [1 ]
机构
[1] Natl Phys Lab, Qual Life Div, Teddington TW11 0LW, Middx, England
关键词
FILMS; SIMS; DAMAGE; BEAMS; MODEL;
D O I
10.1021/ac801352r
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
C-60(n+) ions have been shown to be extremely successful for SIMS depth profiling of a wide range of organic materials, causing significantly less degradation of the molecular information than more traditional primary ions. This work focuses on examining the definition of the interface in a C-60(n+) SIMS depth profile for an organic overlayer on a wafer substrate. First it investigates the optimum method to define the organic/inorganic interface position. Variations of up to 8 nm in the interface position can arise from different definitions of the interface position in the samples investigated here. Second, it looks into the reasons behind large interfacial widths, i.e., poor depth resolution, seen in C-60(n+) depth profiting. This work confirms that, for Irganox 1010 deposited on a wafer, the depth resolution at the Irganox 1010/substrate interface is directly correlated to the roughening of material.
引用
收藏
页码:75 / 79
页数:5
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