The effects of fast neutron irradiation on oxygen in Czochralski silicon

被引:0
作者
Chen Gui-Feng [1 ]
Yan Wen-Bo [1 ]
Chen Hong-Jian [1 ]
Li Xing-Hua [1 ]
Li Yang-Xian [1 ]
机构
[1] Hebei Univ Technol, Sch Mat Sci & Engn, Tianjin 300130, Peoples R China
基金
高等学校博士学科点专项科研基金; 中国国家自然科学基金;
关键词
neutron irradiation; irradiation defects; FTIR spectrometer; positron lifetime; POSITRON-ANNIHILATION; ANNEALING MECHANISMS; SPECTROSCOPY; DIVACANCIES;
D O I
暂无
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The effects of fast neutron irradiation on oxygen atoms in Czochralski silicon (CZ-Si) are investigated systemically by using Fourier transform infrared (FTIR) spectrometer and positron annihilation technique (PAT). Through isochronal annealing, it is found that the trend of variation in interstitial oxygen concentration ([O-i]) in fast neutrons irradiated CZ-Si fluctuates largely with temperature increasing, especially between 500 and 700 degrees C. After the CZ-Si is annealed at 600 degrees C, the V-4 appearing as three-dimensional vacancy clusters causes the formation of the molecule-like oxygen clusters, and more importantly these dimers with small binding energies (0.1-1.0eV) can diffuse into the Si lattices more easily than single oxygen atoms, thereby leading to the strong oxygen agglomerations. When the CZ-Si is annealed at temperature increasing up to 700 degrees C, three-dimensional vacancy clusters disappear and the oxygen agglomerations decompose into single oxygen atoms (O) at interstitial sites. Results from FTIR spectrometer and PAT provide an insight into the nature of the [O-i] at temperatures between 500 and 700 degrees C. It turns out that the large fluctuation of [O-i] after short-time annealing from 500 to 700 degrees C results from the transformation of fast neutron irradiation defects.
引用
收藏
页码:293 / 297
页数:5
相关论文
共 11 条
[1]   Complexes of the self-interstitial with oxygen in irradiated silicon:: a new assignment of the 936 cm-1 band [J].
Hermansson, J ;
Murin, LI ;
Hallberg, T ;
Markevich, VP ;
Lindström, JL ;
Kleverman, M ;
Svensson, BG .
PHYSICA B-CONDENSED MATTER, 2001, 302 :188-192
[2]   Oxygen implanted silicon investigated by positron annihilation spectroscopy [J].
Kruseman, AC ;
Schut, H ;
van Veen, A ;
Fujinami, M .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1999, 148 (1-4) :294-299
[3]   Defect generation in crystalline silicon irradiated with high energy particles [J].
Kuhnke, M ;
Fretwurst, E ;
Lindstrom, G .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2002, 186 :144-151
[4]   The effects of neutron irradiation on the oxygen precipitation in Czochralski-silicon [J].
Li, YX ;
Guo, HY ;
Liu, BD ;
Liu, TJ ;
Hao, QY ;
Liu, CC ;
Yang, DR ;
Que, DL .
JOURNAL OF CRYSTAL GROWTH, 2003, 253 (1-4) :6-9
[5]   Defect engineering in Czochralski silicon by electron irradiation at different temperatures [J].
Lindström, JL ;
Murin, LI ;
Hallberg, T ;
Markevich, VP ;
Svensson, BG ;
Kleverman, M ;
Hermansson, J .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2002, 186 :121-125
[6]   Annealing mechanisms of divacancies in silicon [J].
Poirier, R ;
Avalos, V ;
Dannefaer, S ;
Schlettekatte, F ;
Roorda, S .
PHYSICA B-CONDENSED MATTER, 2003, 340 :609-612
[7]   Divacancies in proton irradiated silicon: Comparison of annealing mechanisms studied with infrared spectroscopy and positron annihilation [J].
Poirier, R ;
Avalos, V ;
Dannefaer, S ;
Schiettekatte, F ;
Roorda, S .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2003, 206 :85-89
[8]   Behaviour of oxygen in CZ-silicon during 430-630°C heat treatment [J].
Prakash, O ;
Upreti, NK ;
Singh, S .
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1998, 52 (2-3) :180-184
[9]   Lifetimes of positrons trapped at Si vacancies [J].
Saito, M ;
Oshiyama, A .
PHYSICAL REVIEW B, 1996, 53 (12) :7810-7814
[10]  
SHIMURA F, 1994, OXYGEN SILICON SEMIC, V42