Sub-100nm pattern generation by laser direct writing using a confinement layer

被引：10

作者：

Klein-Wiele, Jan-Hendrik ^{[1
]}

Simon, Peter ^{[1
]}

机构：

[1] Laser Lab Gottingen eV, D-37077 Gottingen, Germany

来源：

OPTICS EXPRESS | 2013年 / 21卷 / 07期

关键词：

PULSES; METALS; SURFACE; ABLATION; DYNAMICS;

D O I：

10.1364/OE.21.009017

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

A novel technique is introduced that dramatically increases the quality and spatial resolution of directly ablated periodic nanostructures on materials. The presented method utilizes a PMMA confinement layer spin coated on the surface of the ablated material reducing the violence and speed of expansion of the molten material. As a result, droplet formation deteriorating the achievable resolution can be completely avoided. Moreover, motion control of the molten material leads to structural details with dimensions well below the irradiation wavelength. (C) 2013 Optical Society of America

引用

页码：9017 / 9023

页数：7

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