Influence of sputtering conditions on ionic conductivity of LiPON thin films

被引：144
作者：
Hamon, Y
Douard, A
Sabary, F
Marcel, C
Vinatier, P
Pecquenard, B
Levasseur, A
机构：
[1] ICMCB, CNRS, UPR 9048, F-33607 Pessac, France
[2] ENSCPB, F-33607 Pessac, France
[3] CEA Le Ripault, F-37260 Mons, Belgium
来源：
SOLID STATE IONICS | 2006年 / 177卷 / 3-4期
关键词：
solid electrolyte; thin films; ionic conductivity; sputtering target density;
D O I：
10.1016/j.ssi.2005.10.021
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
LiPON films were deposited using radio-frequency magnetron sputtering in a pure N-2 gas atmosphere. The influence of rf power, N-2 pressure, target-substrate distance and target density on thin film composition and ionic conductivity has been studied. Impedance measurements performed between 25 and 80 degrees C have indicated that ionic conductivity increases with nitrogen incorporation into the glass structure. An increase in the deposition rate with the target density has also been observed. (c) 2005 Elsevier B.V. All rights reserved.
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收藏
页码：257 / 261
页数：5
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