Low temperature preparation of transparent, antireflective TiO2 films deposited at different O2/Ar ratios by microwave electron cyclotron resonance magnetron sputtering

被引：7
作者：
Du, Wen [1 ,2 ]
Ye, Yinping [1 ]
Li, Hongxuan [1 ]
Zhao, Fei [1 ,2 ]
Ji, Li [1 ]
Quan, Weilong [1 ,2 ]
Chen, Jianmin [1 ]
Zhou, Huidi [1 ]
机构：
[1] Chinese Acad Sci, Lanzhou Inst Chem & Phys, Lanzhou 730000, Peoples R China
[2] Chinese Acad Sci, Grad Univ, Beijing 100049, Peoples R China
来源：
VACUUM | 2012年 / 86卷 / 09期
基金：
中国国家自然科学基金;
关键词：
Titanium oxide thin film; MW-ECR; O-2/Ar ratio; Antireflection; THIN-FILMS; PARTIAL-PRESSURE; SOLAR-CELLS; TARGETS;
D O I：
10.1016/j.vacuum.2012.01.012
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A serial of crystalline titanium oxide ceramic films were deposited at low temperature using microwave electron cyclotron resonance (MW-ECR) magnetron sputtering with different O-2/Ar ratios. The influences of O-2/Ar ratio on the deposition rate, morphology, crystalline nature, optical adsorption property of the obtained titanium oxide thin films were investigated by means of X-ray diffracticn (XRD), atomic force microscopy (AFM) and UV-Vis spectra. Therefore, the optimum O-2/Ar ratio for deposition of anaitase TiO2 thin films on unheated glass substrate was realized in a MW-ECR magnetron sputtering process. The as-deposited anatase TiO2 films were transparent and were antireflective in the visible region. (C) 2012 Published by Elsevier Ltd.
引用
收藏
页码：1387 / 1392
页数：6
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