GaInNAs quantum well structures for 1.55 μm emission on GaAs by atmospheric pressure metalorganic vapor phase epitaxy

被引:27
|
作者
Hakkarainen, T [1 ]
Toivonen, J [1 ]
Sopanen, M [1 ]
Lipsanen, H [1 ]
机构
[1] Helsinki Univ Technol, Optoelect Labs, FIN-02015 Espoo, Finland
关键词
photoluminescence; rapid thermal annealing; metalorganic vapor phase epitaxy; semiconducting materials;
D O I
10.1016/S0022-0248(01)01750-X
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
GaInNAs/GaAs multiple quantum well (MQW) structures for long wavelength emission were grown by atmospheric pressure metalorganic vapor phase epitaxy using trimethylgallium, trimethylindium, tertiarybutylarsine and dimethylhydrazine precursors. The dependence of the N concentration and the emission wavelength on the In concentration was investigated. The longest wavelengths were obtained with In concentrations of around 23%. Post-growth rapid thermal annealing was performed to enhance the optical quality of the material. Low-temperature photoluminescence (PL) down to 0.77 eV (1.61 mum) was obtained from a Ga0.74In0.26N0.03As0.97 MQW structure. After annealing the PL wavelength of 1.51 mum was obtained at room temperature. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:631 / 636
页数:6
相关论文
共 50 条
  • [41] Photoreflectance characterization of vanadium-doped GaAs layers grown by metalorganic vapor phase epitaxy
    Bilel, C.
    Fitouri, H.
    Zaied, I.
    Bchetnia, A.
    Rebey, A.
    El Jani, B.
    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2015, 31 : 100 - 105
  • [42] Growth of strained GaAs1-ySby layers using metalorganic vapor phase epitaxy
    Khandekar, A. A.
    Yeh, J. Y.
    Mawst, L. J.
    Song, Xueyan
    Babcock, S. E.
    Kuech, T. F.
    JOURNAL OF CRYSTAL GROWTH, 2007, 298 (SPEC. ISS) : 154 - 158
  • [43] Metalorganic vapor phase epitaxy growth of high quality cubic GaN on GaAs (100) substrates
    Wu, J
    Yaguchi, H
    Onabe, K
    Shiraki, Y
    Ito, R
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1998, 37 (3B): : 1440 - 1442
  • [44] Lateral thickness modulation of InGaAs layers on GaAs in selective area metalorganic vapor phase epitaxy
    Terasawa, T
    Nakajima, F
    Motohisa, J
    Fukui, T
    JOURNAL OF CRYSTAL GROWTH, 2001, 223 (04) : 523 - 527
  • [45] GaN/GaAs(100) superlattices grown by metalorganic vapor phase epitaxy using dimethylhydrazine precursor
    Sormunen, J
    Riikonen, J
    Sopanen, M
    Lipsanen, H
    JOURNAL OF CRYSTAL GROWTH, 2004, 270 (3-4) : 346 - 350
  • [46] Selective area growth of GaN on GaAs(001) substrates by metalorganic vapor-phase epitaxy
    Shen, XM
    Feng, G
    Zhang, BS
    Duan, LH
    Wang, YT
    Yang, H
    JOURNAL OF CRYSTAL GROWTH, 2003, 252 (1-3) : 9 - 13
  • [47] GAASP LAYERS GROWN ON (111)-ORIENTED GAAS SUBSTRATES BY METALORGANIC VAPOR-PHASE EPITAXY
    ZHANG, X
    KARAKI, K
    YAGUCHI, H
    ONABE, K
    SHIRAKI, Y
    ITO, R
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1993, 32 (6A): : L755 - L757
  • [48] Enhanced optical performances of strain-compensated 1.3-μm GaInNAs/GaNAs/GaAs quantum-well structures
    Pavelescu, EM
    Jouhti, T
    Peng, CS
    Li, W
    Konttinen, J
    Dumitrescu, M
    Laukkanen, P
    Pessa, M
    JOURNAL OF CRYSTAL GROWTH, 2002, 241 (1-2) : 31 - 38
  • [49] Effects of Rapid Thermal Annealing on OpticalProperties of GaInNAs/ GaAs Single Quantum Well Grown by Plasma- Assisted Molecular Beam Epitaxy
    张伟
    潘钟
    李联合
    王学宇
    林耀望
    半导体学报, 2000, (10) : 974 - 978
  • [50] Optical transitions in cubic GaN grown on GaAs(100) substrates by metalorganic vapor-phase epitaxy
    Wu, J
    Yaguchi, H
    Onabe, K
    Ito, R
    Shiraki, Y
    JOURNAL OF CRYSTAL GROWTH, 1998, 189 : 415 - 419