Impact-ionization and noise characteristics of thin III-V avalanche photodiodes

被引:122
作者
Saleh, MA [1 ]
Hayat, MM
Sotirelis, PP
Holmes, AL
Campbell, JC
Saleh, BEA
Teich, MC
机构
[1] Univ Dayton, Electroopt Program, Dayton, OH 45469 USA
[2] Univ New Mexico, Dept Elect & Comp Engn, Albuquerque, NM 87131 USA
[3] Univ Illinois, Natl Ctr Supercomp Applicat, Urbana, IL 61801 USA
[4] Aeronaut Syst Ctr Major Shared Resource Ctr, Wright Patterson AFB, OH 45433 USA
[5] Univ Texas, Dept Elect & Comp Engn, Austin, TX 78712 USA
[6] Boston Univ, Dept Elect & Comp Engn, Boston, MA 02215 USA
基金
美国国家科学基金会;
关键词
AlGaAs; dead space; excess noise factor; GaAs; gain; impact-ionization; InAlAs; InP; ionization coefficients; ionization threshold energy; thin avalanche photodiodes;
D O I
10.1109/16.974696
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
It is, by now, well known that McIntyre's localized carrier-multiplication theory cannot explain the suppression of excess noise factor observed in avalanche photodiodes (APDs) that make use of thin multiplication regions. We demonstrate that a carrier multiplication model that incorporates the effects of dead space, as developed earlier by Hayat et al. provides excellent agreement with the impact-ionization and noise characteristics of thin InP, In0.52Al0.48As, GaAs, and Al0.2Ga0.8As APDs, with multiplication regions of different widths. We outline a general technique that facilitates the calculation of ionization coefficients for carriers that have traveled a distance exceeding the dead space (enabled carriers), directly from experimental excess-noise-factor data. These coefficients depend on the electric field in exponential fashion and are independent of multiplication width, as expected on physical grounds. The procedure for obtaining the ionization coefficients is used in conjunction with the dead-space-multiplication theory (DSMT) to predict excess noise factor versus mean-gain curves that are in excellent accord with experimental data for thin M-V APDs, for all multiplication-region widths.
引用
收藏
页码:2722 / 2731
页数:10
相关论文
共 48 条
  • [1] THRESHOLD ENERGIES FOR ELECTRON-HOLE PAIR PRODUCTION BY IMPACT IONIZATION IN SEMICONDUCTORS
    ANDERSON, CL
    CROWELL, CR
    [J]. PHYSICAL REVIEW B, 1972, 5 (06): : 2267 - &
  • [2] [Anonymous], FUNDAMENTALS PHOTONI
  • [3] Characteristics of GaAs and AlGaAs homojunction avalanche photodiodes with thin multiplication regions
    Anselm, KA
    Yuan, P
    Hu, C
    Lenox, C
    Nie, H
    Kinsey, G
    Campbell, JC
    Streetman, BG
    [J]. APPLIED PHYSICS LETTERS, 1997, 71 (26) : 3883 - 3885
  • [4] THRESHOLDS OF IMPACT IONIZATION IN SEMICONDUCTORS
    BUDE, J
    HESS, K
    [J]. JOURNAL OF APPLIED PHYSICS, 1992, 72 (08) : 3554 - 3561
  • [5] EXPERIMENTAL-DETERMINATION OF IMPACT IONIZATION COEFFICIENTS IN (100) GAAS
    BULMAN, GE
    ROBBINS, VM
    BRENNAN, KF
    HESS, K
    STILLMAN, GE
    [J]. IEEE ELECTRON DEVICE LETTERS, 1983, 4 (06) : 181 - 185
  • [6] MULTIPLICATION NOISE OF WIDE-BANDWIDTH INP/INGAASP/INGAAS AVALANCHE PHOTODIODES
    CAMPBELL, JC
    CHANDRASEKHAR, S
    TSANG, WT
    QUA, GJ
    JOHNSON, BC
    [J]. JOURNAL OF LIGHTWAVE TECHNOLOGY, 1989, 7 (03) : 473 - 478
  • [7] DEAD-TIME-CORRECTED PHOTOCOUNTING DISTRIBUTIONS FOR LASER RADIATION
    CANTOR, BI
    TEICH, MC
    [J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1975, 65 (07) : 786 - 791
  • [8] DESIGN CONSIDERATIONS OR HIGH-PERFORMANCE AVALANCHE PHOTODIODE MULTIPLICATION LAYERS
    CHANDRAMOULI, V
    MAZIAR, CM
    CAMPBELL, JC
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1994, 41 (05) : 648 - 654
  • [9] IMPACT IONIZATION IN MULTILAYERED HETEROJUNCTION STRUCTURES
    CHIN, R
    HOLONYAK, N
    STILLMAN, GE
    TANG, JY
    HESS, K
    [J]. ELECTRONICS LETTERS, 1980, 16 (12) : 467 - 469
  • [10] ELECTRON AND HOLE IMPACT IONIZATION COEFFICIENTS IN INP DETERMINED BY PHOTOMULTIPLICATION MEASUREMENTS
    COOK, LW
    BULMAN, GE
    STILLMAN, GE
    [J]. APPLIED PHYSICS LETTERS, 1982, 40 (07) : 589 - 591