Stability of oxide films formed on titanium and its alloys

被引:0
作者
Popa, MV
Vasilescu, E
Drob, P
Lopez, AS
Rosca, IM
Vasilescu, C
Anghel, M
机构
[1] Inst Phys Chem, Bucharest 060021, Romania
[2] Las Palmas de Gran Canaria Univ, Las Palmas Gran Canaria, Spain
关键词
D O I
暂无
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
The corrosion stability of the oxide films formed on titanium and two binary titanium alloys (Ti-15Mo, Ti-32Mo) surface in aggressive 20% and 60% nitric acid solutions at different temperatures was investigated. The influence of molybdenum on the behavior of the passive layers was distinguished. The study of these films was carried out using electrochemical impedance spectroscopy (EIS), potentiostatic and potentiodynamic polarization techniques. Titanium and its binary alloys are self-passivate in nitric acid solutions due to the forming of the protective, compact TiO2 oxide film. These passive films are more stable for the binary alloys than for the base metal, as a consequence of molybdenum's participation with insoluble oxides.
引用
收藏
页码:837 / 842
页数:6
相关论文
共 15 条
[1]   KINETICS OF ANODIC OXIDE-FILM GROWTH ON TITANIUM .2. NEUTRAL AND ALKALINE MEDIA [J].
AMMAR, IA ;
KAMAL, I .
ELECTROCHIMICA ACTA, 1971, 16 (09) :1555-&
[2]  
ANDREEVA VV, 1966, T MEJD C KORR MET 3, V1, P469
[3]   INSITU RAMAN-SPECTRA OF ANODICALLY FORMED TITANIUM-DIOXIDE LAYERS IN SOLUTIONS OF H2SO4, KOH, AND HNO3 [J].
ARSOV, LD ;
KORMANN, C ;
PLIETH, W .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1991, 138 (10) :2964-2970
[4]  
BOUKAMP BA, 1986, SOLID STATE IONICS, V23, P89
[5]  
DELPLANCKE JL, 1989, ELECTROCHIM ACTA, V34, P75
[6]   APPLICATION OF THE ELECTROREFLECTANCE TECHNIQUE TO A 3-MEDIUM SYSTEM [J].
FROELICHER, M ;
HUGOTLEGOFF, A ;
JOVANCICEVIC, V .
THIN SOLID FILMS, 1981, 82 (01) :81-88
[7]  
Hanson M., 1958, CONSTITUTION BINARY
[8]  
LYNCH CT, 1971, HDB MAT SCI, V1
[9]   COMPOSITION AND STRUCTURE OF THE ANODIC FILMS ON TITANIUM IN AQUEOUS-SOLUTIONS [J].
PANKUCH, M ;
BELL, R ;
MELENDRES, CA .
ELECTROCHIMICA ACTA, 1993, 38 (18) :2777-2779
[10]  
Pourbaix M., 1974, ATLAS ELECTROCHEMICA, P213