Comparative optical study of Eu3+ ions doping in InGaN/GaN quantum dots and GaN layer grown by molecular beam epitaxy

被引:4
作者
Andreev, T
Liem, NQ
Hori, Y
Tanaka, M
Oda, O
Daudin, B
Dang, DLS
机构
[1] UJF, CEA, CNRS, Res Grp Nanophys & Semicond,DRFMC,SP2M,PSC, F-38054 Grenoble 9, France
[2] Vietnamese Acad Sci & Technol, Inst Sci Mat, Hanoi, Vietnam
[3] Hanoi Natl Univ, Coll Technol, Hanoi, Vietnam
[4] NGK Insulators Ltd, Mizuho Ku, Nagoya, Aichi, Japan
[5] Univ Grenoble 1, CEA, CNRS,UMR5588, Res Grp Nanophys & Semicond,Lab Spectrometrie Phy, F-38402 St Martin Dheres, France
关键词
D O I
10.1016/j.optmat.2005.09.061
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We report on a comparative optical study of InGaN:Eu quantum dots (QDs) and GaN:Eu layer grown by molecular beam epitaxy (MBE). Analysis of the D-5(0)-> F-4(7) transition as a function of the excitation wavelength shows that Eu3+ ions in InGaN:Eu QDs are located inside InGaN QDs and also in the GaN barrier layer. The existence of Eu3+ ions in the GaN barrier layer is explained by Eu segregation/diffusion during growth. For Eu3+ ions located inside InGaN QDs the photoluminescence (PL) shows only a slight decrease with temperature from 5 K to 300 K. In contrast, the PL from Eu3+ ions in the GaN barrier layer or in GaN thick layer shows a much more pronounced thermal quenching. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:775 / 779
页数:5
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