Local Reorganization of Diblock Copolymer Domains in Directed Self-Assembly Monitored by in Situ High-Temperature AFM

被引:7
作者
Stehlin, Fabrice [1 ]
Diot, Frederic [1 ]
Gwiazda, Agnieszka [1 ]
Dirani, Ali [1 ]
Salaun, Mathieu [2 ]
Zelsmann, Marc [2 ]
Soppera, Olivier [1 ]
机构
[1] UHA, CNRS, IS2M, UMR 7361, F-68057 Mulhouse, France
[2] Univ Grenoble 1, CNRS, CEA, LTM, F-38054 Grenoble 9, France
关键词
BLOCK-COPOLYMERS; ORDER; LITHOGRAPHY; ALIGNMENT; PATTERN; FILMS; GRAPHOEPITAXY; ORIENTATION; TEMPLATES; SURFACE;
D O I
10.1021/la402935v
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
In situ high-temperature AFM was used to locally follow dynamic processes, leading to directed self-assembly of copolymers in the context of graphoepitaxy. We focused on the effect of heating for temperatures much higher than the T-g of the used PS-b-PMMA polymer. We showed that such conditions favors the block rearrangement, leading to very regular and perfectly aligned structures in limited times. The use of in situ AFM allowed us to locally investigate the self-organization process at high temperature, thus bringing new insights into self-assembly of block copolymers by graphoepitaxy. In particular, we demonstrate that a slight increase of temperature between 180 and 200 degrees C allowed overpassing an energy barrier and considerably improves the long distance arrangement, even for relatively short times.
引用
收藏
页码:12796 / 12803
页数:8
相关论文
共 38 条
  • [1] QUASI-STATIC MECHANICAL-PROPERTIES OF LAMELLAR BLOCK COPOLYMER MICROSTRUCTURE
    AMUNDSON, K
    HELFAND, E
    [J]. MACROMOLECULES, 1993, 26 (06) : 1324 - 1332
  • [2] GROWTH OF 2-DIMENSIONAL DOMAINS IN COPOLYMER THIN-FILMS
    AUSSERRE, D
    CHATENAY, D
    COULON, G
    COLLIN, B
    [J]. JOURNAL DE PHYSIQUE, 1990, 51 (22): : 2571 - 2580
  • [3] Life's lessons in design
    Ball, P
    [J]. NATURE, 2001, 409 (6818) : 413 - 416
  • [4] Nanometer-scale pattern registration and alignment by directed diblock copolymer self-assembly
    Black, CT
    Bezencenet, O
    [J]. IEEE TRANSACTIONS ON NANOTECHNOLOGY, 2004, 3 (03) : 412 - 415
  • [5] Calcium-containing poly(urethane-urea)s: Synthesis, spectral, and thermal studies
    Jayakumar, R
    Nanjundan, S
    [J]. JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, 2004, 42 (08) : 1809 - 1819
  • [6] Surface-induced structure formation of polymer blends on patterned substrates
    Böltau, M
    Walheim, S
    Mlynek, J
    Krausch, G
    Steiner, U
    [J]. NATURE, 1998, 391 (6670) : 877 - 879
  • [7] Pathways to macroscale order in nanostructured block copolymers
    Chen, ZR
    Kornfield, JA
    Smith, SD
    Grothaus, JT
    Satkowski, MM
    [J]. SCIENCE, 1997, 277 (5330) : 1248 - 1253
  • [8] Templated self-assembly of block copolymers: Effect of substrate topography
    Cheng, JY
    Ross, CA
    Thomas, EL
    Smith, HI
    Vancso, GJ
    [J]. ADVANCED MATERIALS, 2003, 15 (19) : 1599 - +
  • [9] Fabrication of nanostructures with long-range order using block copolymer lithography
    Cheng, JY
    Ross, CA
    Thomas, EL
    Smith, HI
    Vancso, GJ
    [J]. APPLIED PHYSICS LETTERS, 2002, 81 (19) : 3657 - 3659
  • [10] Orienting the Demixion of a Diblock-copolymer Using 193 nm Interferometric Lithography for the Controlled Deposition of Nanoparticles
    Dirani, Ali
    Stehlin, Fabrice
    Dika, Ihab
    Spangenberg, Arnaud
    Grumbach, Nathan
    Gallani, Jean-Louis
    Donnio, Bertrand
    Greget, Romain
    Begin-Colin, Sylvie
    Demortiere, Arnaud
    Soppera, Olivier
    [J]. MACROMOLECULAR RAPID COMMUNICATIONS, 2011, 32 (20) : 1627 - 1633