The dissociative adsorption of unsaturated alcohols on Si(111)-7x7

被引:8
作者
Tang, Hai Hua [1 ]
Dai, Yu Jing [1 ]
Shao, Yan Xia [1 ]
Ning, Yue Sheng [1 ]
Huang, Jing Yan [1 ]
Lai, Yee Hing [1 ]
Peng, Bo [2 ]
Huang, Wei [2 ]
Xu, Guo Qin [1 ]
机构
[1] Natl Univ Singapore, Dept Chem, Singapore 119260, Singapore
[2] Nanjing Univ Posts & Telecommun, IAM, Nanjing 210003, Peoples R China
基金
新加坡国家研究基金会;
关键词
electron energy loss spectroscopy (EELS); X-ray photoelectron spectroscopy; density functional calculations; chemisorption; physical adsorption; surface chemical reaction; alcohols; silicon;
D O I
10.1016/j.susc.2008.06.019
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
High-resolution electron energy loss spectroscopy (HREELS), X-ray photoelectron spectroscopy (XPS) and density functional theory (DFT) calculations were used to investigate the attachment of allyl and propargyl alcohols on Si(111)-7 x 7 under ultra-high vacuum conditions. The HREELS spectra of chemisorbed allyl alcohol (AA) show the concurrent appearance of characteristic stretching vibrations of Si-H (2104 cm(-1)) and Si-O (795 cm(-1)) coupled with the retention of vibrational features of C=C stretching (1657 cm(-1)) and (Sp(2))C-H stretching (3012 and 3102 cm(-1)). These results clearly demonstrate the dissociative reaction nature via the hydroxyl group for the chemisorption of AA on Si(111)-7x7, which was further supported by XPS and DFT studies. A similar reaction pathway was found for propargyl alcohol (PA) adsorbed on the same Si(111)-7x7 surface. Our studies suggest that OH dissociation is highly favorable compared to [2+2]-like cycloadditions via C=C/C C for organic reactions on silicon surfaces, which may be explained by the large spatial separation between the adjacent adatom-rest atom pair on Si(111)-7x7. (C) 2008 Elsevier B.V. All rights reserved.
引用
收藏
页码:2647 / 2657
页数:11
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