This work deals with the deposition of thin films using an atmospheric pressure direct current nitrogen plasma jet with tetramethyldisiloxane as precursor. The effect of O-2 flow and plasma discharge power on film deposition rate and film chemical characteristics is investigated in detail by surface profilometry, Fourier transform infrared spectroscopy, and X-ray photoelectron spectroscopy. It is found that a higher deposition rate is obtained at higher oxygen flow rates and higher discharge powers. Increasing discharge power shows a certain amount of capability to transfer low oxygen content bonds to high oxygen content bonds. Organic films can be deposited in a pure nitrogen atmosphere. The film chemical composition can be tuned to a more inorganic structure by admixture of O-2 leading to an increase in SiO4 units at high oxygen flow rates.
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Univ South Australia, Future Ind Inst, Adelaide, SA 5095, AustraliaUniv South Australia, Future Ind Inst, Adelaide, SA 5095, Australia
Al-Bataineh, Sameer A.
Cavallaro, Alex A.
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Univ South Australia, Future Ind Inst, Adelaide, SA 5095, AustraliaUniv South Australia, Future Ind Inst, Adelaide, SA 5095, Australia
Cavallaro, Alex A.
Michelmore, Andrew
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Univ South Australia, Future Ind Inst, Adelaide, SA 5095, Australia
Univ South Australia, Sch Engn, Adelaide, SA, AustraliaUniv South Australia, Future Ind Inst, Adelaide, SA 5095, Australia
Michelmore, Andrew
Macgregor, Melanie N.
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Univ South Australia, Future Ind Inst, Adelaide, SA 5095, AustraliaUniv South Australia, Future Ind Inst, Adelaide, SA 5095, Australia
Macgregor, Melanie N.
Whittle, Jason D.
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Univ South Australia, Future Ind Inst, Adelaide, SA 5095, Australia
Univ South Australia, Sch Engn, Adelaide, SA, AustraliaUniv South Australia, Future Ind Inst, Adelaide, SA 5095, Australia
Whittle, Jason D.
Vasilev, Krasimir
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Univ South Australia, Future Ind Inst, Adelaide, SA 5095, Australia
Univ South Australia, Sch Engn, Adelaide, SA, AustraliaUniv South Australia, Future Ind Inst, Adelaide, SA 5095, Australia
机构:
Chinese Acad Sci, Inst Elect Engn, Beijing Int S&T Cooperat Base Plasma Sci & Energy, Beijing 100190, Peoples R ChinaChinese Acad Sci, Inst Elect Engn, Beijing Int S&T Cooperat Base Plasma Sci & Energy, Beijing 100190, Peoples R China
Kong, Fei
Zhang, Penghao
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Chinese Acad Sci, Inst Elect Engn, Beijing Int S&T Cooperat Base Plasma Sci & Energy, Beijing 100190, Peoples R ChinaChinese Acad Sci, Inst Elect Engn, Beijing Int S&T Cooperat Base Plasma Sci & Energy, Beijing 100190, Peoples R China
Zhang, Penghao
Yu, Weixin
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Chinese Acad Sci, Inst Elect Engn, Beijing Int S&T Cooperat Base Plasma Sci & Energy, Beijing 100190, Peoples R ChinaChinese Acad Sci, Inst Elect Engn, Beijing Int S&T Cooperat Base Plasma Sci & Energy, Beijing 100190, Peoples R China
Yu, Weixin
Zhang, Cheng
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Chinese Acad Sci, Inst Elect Engn, Beijing Int S&T Cooperat Base Plasma Sci & Energy, Beijing 100190, Peoples R China
Univ Chinese Acad Sci, Beijing 100049, Peoples R ChinaChinese Acad Sci, Inst Elect Engn, Beijing Int S&T Cooperat Base Plasma Sci & Energy, Beijing 100190, Peoples R China
Zhang, Cheng
Liu, Jianben
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China Elect Power Res Inst, State Key Lab Power Grid Environm Protect, Wuhan Branch, Wuhan 430074, Peoples R ChinaChinese Acad Sci, Inst Elect Engn, Beijing Int S&T Cooperat Base Plasma Sci & Energy, Beijing 100190, Peoples R China
Liu, Jianben
Ren, Chengyan
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Chinese Acad Sci, Inst Elect Engn, Beijing Int S&T Cooperat Base Plasma Sci & Energy, Beijing 100190, Peoples R China
Univ Chinese Acad Sci, Beijing 100049, Peoples R ChinaChinese Acad Sci, Inst Elect Engn, Beijing Int S&T Cooperat Base Plasma Sci & Energy, Beijing 100190, Peoples R China
Ren, Chengyan
Shao, Tao
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Chinese Acad Sci, Inst Elect Engn, Beijing Int S&T Cooperat Base Plasma Sci & Energy, Beijing 100190, Peoples R China
Univ Chinese Acad Sci, Beijing 100049, Peoples R ChinaChinese Acad Sci, Inst Elect Engn, Beijing Int S&T Cooperat Base Plasma Sci & Energy, Beijing 100190, Peoples R China