Deposition of a TMDSO-Based Film by a Non-Equilibrium Atmospheric Pressure DC Plasma Jet

被引：24

作者：

Deng, Xiaolong ^{[1
,2
]}

Nikiforov, Anton Yu ^{[1
,3
]}

De Geyter, Nathalie ^{[1
]}

Morent, Rino ^{[1
]}

Leys, Christophe ^{[1
]}

机构：

[1] Univ Ghent, Dept Appl Phys, B-9000 Ghent, Belgium

[2] Natl Univ Def Technol, Coll Optoelect Sci & Engn, Changsha 410073, Hunan, Peoples R China

[3] Inst Solut Chem RAS, Ivanovo 153045, Russia

来源：

PLASMA PROCESSES AND POLYMERS | 2013年 / 10卷 / 07期

基金：

欧洲研究理事会;

关键词：

DC discharges; deposition; plasma jet; FT-IR; XPS; DIELECTRIC BARRIER DISCHARGE; COATINGS; POLYMERIZATION;

D O I：

10.1002/ppap.201200166

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

This work deals with the deposition of thin films using an atmospheric pressure direct current nitrogen plasma jet with tetramethyldisiloxane as precursor. The effect of O-2 flow and plasma discharge power on film deposition rate and film chemical characteristics is investigated in detail by surface profilometry, Fourier transform infrared spectroscopy, and X-ray photoelectron spectroscopy. It is found that a higher deposition rate is obtained at higher oxygen flow rates and higher discharge powers. Increasing discharge power shows a certain amount of capability to transfer low oxygen content bonds to high oxygen content bonds. Organic films can be deposited in a pure nitrogen atmosphere. The film chemical composition can be tuned to a more inorganic structure by admixture of O-2 leading to an increase in SiO4 units at high oxygen flow rates.

引用

页码：641 / 648

页数：8

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